2018
DOI: 10.1103/physrevapplied.10.064052
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First-principles study on the negative- U behavior of K centers in amorphous Si3

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Cited by 8 publications
(7 citation statements)
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“…These results agree well with prior DFT reference data (indicated by circles), which were derived from averaging results across 40 smaller amorphous structures including 112 atoms. In particular, shoulder peaks at 90° are also well-reproduced in g (θ), which are indicative of square planar structures …”
Section: General-purpose Gnn-ipsupporting
confidence: 86%
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“…These results agree well with prior DFT reference data (indicated by circles), which were derived from averaging results across 40 smaller amorphous structures including 112 atoms. In particular, shoulder peaks at 90° are also well-reproduced in g (θ), which are indicative of square planar structures …”
Section: General-purpose Gnn-ipsupporting
confidence: 86%
“…In particular, shoulder peaks at 90°are also well-reproduced in g(θ), which are indicative of square planar structures. 52 We note that SevenNet-0 is exclusively trained on crystal structures, including polymorphs of Si 3 N 4 . Disordered phases like liquid or amorphous are not present in the training set.…”
Section: Model Trainingmentioning
confidence: 99%
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“…Unique local orders of amorphous phases were also reported for other materials. [ 35,36,41 ] These I‐centered motifs produce two distinct CuICu bond angles around 60° and 100°, as found in the tetragonal phase. On the other hand, Cu ions with CN = 4 maintain the tetrahedral shape.…”
Section: Resultsmentioning
confidence: 84%
“…The nature of the sites responsible for electron and hole trapping is still under discussion. In the past, the dangling Si bond or K -center has been the target of several experimental and theoretical studies [ 5 , 6 , 7 , 8 ], being suspected as the main contributor to the charge trapping mechanism in amorphous silicon nitrides. However, experimental investigations of the defect concentration (≈ cm [ 1 , 9 , 10 ]) show that these dangling bonds only make up a small portion of the total density of electrical active defects.…”
Section: Introductionmentioning
confidence: 99%