Finite element simulation of ion-beam lithography mask fabrication

Tejeda, R.; Frisque, Gary A.; Engelstad, Roxann L.; Lovell, Edward G.; Haugeneder, E.; Löschner, H.

doi:10.1016/s0167-9317(99)00046-5

Cited by 8 publications

(2 citation statements)

References 2 publications

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“…Normally, a stress level on the order of 10 MPa is enough to ensure the flatness of the mask membranes 6. Displacement and deformation by this level of stresses has to be compensated in the mask design stage, and the amount of compensation can be estimated by measurement31 or numerical modeling 32…”

Section: Projection Masks and Resistsmentioning

confidence: 99%

Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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Ion projection lithography (IPL) is an emerging technology and a major candidate for the next-generation lithography (NGL) designed to complement and supplement current optical lithographic techniques for future chip manufacturing. In this Review, the recent developments of IPL technology are examined with an emphasis on its ability to fabricate a wide variety of nanostructures for the semiconductor industry. Following an introduction of the uniqueness and strength of the technology, the basics of ion-source development and ion-target interactions with and without chemical enhancement are presented. The developments in equipment systems, masks, and resists are subsequently studied. The resolution of printed nanostructures and the corresponding throughput of the current system are assessed for NGL. Finally, concluding remarks are presented to summarize the strengths and weaknesses of the current technology and to suggest the scope for future improvement.

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Section: Projection Masks and Resistsmentioning

confidence: 99%

Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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“…[4][5][6] To effectively employ PSE it is necessary to understand the mechanical properties of the prestressed mask and to calculate the distortions that will appear during mask fabrication, using the finite element method. [4][5][6] To effectively employ PSE it is necessary to understand the mechanical properties of the prestressed mask and to calculate the distortions that will appear during mask fabrication, using the finite element method.…”

Section: Introductionmentioning

confidence: 99%