2012
DOI: 10.1108/03056121211250632
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Filling through holes and blind microvias with copper using reverse pulse plating and insoluble anodes

Abstract: Purpose -The purpose of this paper is to present a summary of development work made in technical centres and on the subsequent customer qualification of copper filled through holes and blind microvias. Design/methodology/approach -Various copper deposition parameters were investigated in a small-scale production line which was then extended to full-scale production qualification in a horizontal conveyorised system. Samples of substrates with copper filled through holes were qualified at end-user facilities. Fi… Show more

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Cited by 28 publications
(26 citation statements)
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“…As we move to the next generation of these pillar bumps (from 90 μm pillar diameter/40 μm pillar height to 10 μm pillar diameter/50 μm pillar height-see Fig. 1a), the aspect ratio of the bumps keeps getting higher which is a problem since electroplating at this scale is limited to a maximum aspect ratio of ≈2:1 22 . Thus, fabricating these structures is out of the capabilities of the current electroplating processes used to make the pillar bump arrays.…”
Section: Introductionmentioning
confidence: 99%
“…As we move to the next generation of these pillar bumps (from 90 μm pillar diameter/40 μm pillar height to 10 μm pillar diameter/50 μm pillar height-see Fig. 1a), the aspect ratio of the bumps keeps getting higher which is a problem since electroplating at this scale is limited to a maximum aspect ratio of ≈2:1 22 . Thus, fabricating these structures is out of the capabilities of the current electroplating processes used to make the pillar bump arrays.…”
Section: Introductionmentioning
confidence: 99%
“…Such boards would be especially desirable in the mobile phone market which uses Cu-filled thorough hole vias (THVs) of low aspect ratio of 4:1, as these currently require high fabrication costs because of special filling chemistry and plating waveforms (Roelfs, 2013).…”
Section: Introductionmentioning
confidence: 99%
“…Such interconnects would enable a) increased electrical and thermal conductivity, over the partially plated vias and b) multilayer fabrication with less thermally intensive bonding operations, increasing board lifetime and reducing fabrication costs. Such boards would be especially desirable in the mobile phone market which employs Cu filled THVs, of low aspect ratio of 4:1, as these currently require high fabrication costs due to special filling chemistry and plating waveforms (Roelfs et al, 2013).…”
mentioning
confidence: 99%
“…Two multilayer structures are combined together to form a system after curing prepreg for lamination, whereas the cured conductive paste is used to generate electric conduction for these two multilayer structures. Such design can prevent the extremely high aspect ratio of through holes to result in the defective copper deposit around through holes (Wang et al , 2014; Roelfs et al , 2012; Kisiel et al , 2007).…”
Section: Methodsmentioning
confidence: 99%