2004
DOI: 10.1063/1.1738936
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Ferroelectric properties of La and Zr substituted Bi4Ti3O12 thin films

Abstract: Thin films of A-site substituted, B-site substituted, and both A- and B-sites cosubstituted Bi4Ti3O12 (BTO) by La3+ and Zr4+, i.e., Bi3.25La0.75Ti3O12 (BLT), Bi4Ti2.8Zr0.2O12 (BTZ), and Bi3.25La0.75Ti2.8Zr0.2O12 (BLTZ), were fabricated on Pt/Ti/SiO2/Si substrates by pulsed laser deposition. Structures of the films are investigated by x-ray diffraction, Raman spectroscopy, and scanning electron microscopy. Compared to the well known BLT films, both the BTZ and BLTZ films have larger remanent polarization (Pr) b… Show more

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Cited by 53 publications
(21 citation statements)
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“…[9] In addition, the title composition has shown great potential applications in memory devices. A lot of research work was reported by Zhang et al, [10] prepared in thin-film form.…”
Section: Introductionmentioning
confidence: 99%
“…[9] In addition, the title composition has shown great potential applications in memory devices. A lot of research work was reported by Zhang et al, [10] prepared in thin-film form.…”
Section: Introductionmentioning
confidence: 99%
“…1 Some metal oxides, such as barium strontium titanate and bismuth titanate, have also been studied for nonvolatile ferroelectric random access memory applications. 4,5 It is now recognized that oxygen vacancies in metal oxides play an important role in degrading the leakage characteristics of devices. During device fabrication processes, however, oxygen vacancies are often easily introduced into metal oxides through silicidation, desorption, silicate formation, and other phenomena.…”
Section: Introductionmentioning
confidence: 99%
“…A change in lattice parameters is expected upon substitution of Zr 4+ for Ti 4+ ion, because the ionic radius of Zr 4+ (r Zr = 0.72 Å ) is approximately 18% larger than that of Ti 4+ (r Ti = 0.605 Å ). 21 Greater change in lattice parameters leads to further octahedral distortion. Table I summarizes the lattice parameters calculated based on Bi 4 Ti 3 O 12 (parent compound).…”
Section: Methodsmentioning
confidence: 99%