Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant

Butkutė, Agnė; Merkininkaitė, Greta; Jurkšas, Tomas; Stančikas, Jokūbas; Baravykas, Tomas; Vargalis, Rokas; Tičkūnas, Titas; Bachmann, Julien; Šakirzanovas, Simas; Sirutkaitis, Valdas; Jonušauskas, Linas

doi:10.3390/ma15082817

Cited by 12 publications

(13 citation statements)

References 38 publications

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“…As literature shows, rougher surfaces introduce significant flow resistance [ 29 ]. To avoid this, scientists are using SLE, which offers the capability to produce structures with surface roughness below 200 nm [ 30 ]. The surface quality criteria are one of the key disadvantages of femtosecond laser ablation.…”

Section: Results and Discussionmentioning

confidence: 99%

Fabrication of Microfluidic Tesla Valve Employing Femtosecond Bursts

Andriukaitis

Vargalis²,

Šerpytis

et al. 2022

Micromachines

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Expansion of the microfluidics field dictates the necessity to constantly improve technologies used to produce such systems. One of the approaches which are used more and more is femtosecond (fs) direct laser writing (DLW). The subtractive model of DLW allows for directly producing microfluidic channels via ablation in an extremely simple and cost-effective manner. However, channel surface roughens are always a concern when direct fs ablation is used, as it normally yields an RMS value in the range of a few µm. One solution to improve it is the usage of fs bursts. Thus, in this work, we show how fs burst mode ablation can be optimized to achieve sub-µm surface roughness in glass channel fabrication. It is done without compromising on manufacturing throughput. Furthermore, we show that a simple and cost-effective channel sealing methodology of thermal bonding can be employed. Together, it allows for production functional Tesla valves, which are tested. Demonstrated capabilities are discussed.

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Section: Results and Discussionmentioning

confidence: 99%

Fabrication of Microfluidic Tesla Valve Employing Femtosecond Bursts

Andriukaitis

Vargalis²,

Šerpytis

et al. 2022

Micromachines

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“…Induced electron plasma waves inside the material interfere with incident radiation to produce interference patterns [ 45 , 50 ] that result in permanent periodic modifications. Subsequently, longer periods that result from higher wavelengths enable easier liquid penetration into the nanogratings due to the capillary forces and surface-wetting properties [ 27 ]. Etching rates that were only slightly lower than the maximum results were achieved by using 2nd harmonic 500 nJ pulse energy or 28.2 J/cm 2 energy density radiation.…”

Section: Resultsmentioning

confidence: 99%

“…Selectivity values above 1000 could be obtained for fused silica by laser parameter optimization [ 22 ]. Meanwhile, selectivity values above 2000 can be achieved by introducing a particular burst regime [ 26 ] or adding organic solvents to the etchant [ 27 ]. SLE is a perfect technology for high aspect ratio structure fabrication.…”

Section: Introductionmentioning

confidence: 99%

Sapphire Selective Laser Etching Dependence on Radiation Wavelength and Etchant

et al. 2022

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Transparent and high-hardness materials have become the object of wide interest due to their optical and mechanical properties; most notably, concerning technical glasses and crystals. A notable example is sapphire—one of the most rigid materials having impressive mechanical stability, high melting point and a wide transparency window reaching into the UV range, together with impressive laser-induced damage thresholds. Nonetheless, using this material for 3D micro-fabrication is not straightforward due to its brittle nature. On the microscale, selective laser etching (SLE) technology is an appropriate approach for such media. Therefore, we present our research on C-cut crystalline sapphire microprocessing by using femtosecond radiation-induced SLE. Here, we demonstrate a comparison between different wavelength radiation (1030 nm, 515 nm, 343 nm) usage for material modification and various etchants (hydrofluoric acid, sodium hydroxide, potassium hydroxide and sulphuric and phosphoric acid mixture) comparison. Due to the inability to etch crystalline sapphire, regular SLE etchants, such as hydrofluoric acid or potassium hydroxide, have limited adoption in sapphire selective laser etching. Meanwhile, a 78% sulphuric and 22% phosphoric acid mixture at 270 °C temperature is a good alternative for this process. We present the changes in the material after the separate processing steps. After comparing different processing protocols, the perspective is demonstrated for sapphire structure formation.

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“…The etching protocols were optimized for the fastest etching procedure. This optimization has already been published elsewhere [ 36 ].…”

Section: Methodsmentioning

confidence: 99%

Combined Femtosecond Laser Glass Microprocessing for Liver-on-Chip Device Fabrication

Butkutė

Jurkšas²,

Baravykas³

et al. 2023

Materials

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Nowadays, lab-on-chip (LOC) devices are attracting more and more attention since they show vast prospects for various biomedical applications. Usually, an LOC is a small device that serves a single laboratory function. LOCs show massive potential for organ-on-chip (OOC) device manufacturing since they could allow for research on the avoidance of various diseases or the avoidance of drug testing on animals or humans. However, this technology is still under development. The dominant technique for the fabrication of such devices is molding, which is very attractive and efficient for mass production, but has many drawbacks for prototyping. This article suggests a femtosecond laser microprocessing technique for the prototyping of an OOC-type device—a liver-on-chip. We demonstrate the production of liver-on-chip devices out of glass by using femtosecond laser-based selective laser etching (SLE) and laser welding techniques. The fabricated device was tested with HepG2(GS) liver cancer cells. During the test, HepG2(GS) cells proliferated in the chip, thus showing the potential of the suggested technique for further OOC development.

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Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant

Cited by 12 publications

References 38 publications

Fabrication of Microfluidic Tesla Valve Employing Femtosecond Bursts

Fabrication of Microfluidic Tesla Valve Employing Femtosecond Bursts

Sapphire Selective Laser Etching Dependence on Radiation Wavelength and Etchant

Combined Femtosecond Laser Glass Microprocessing for Liver-on-Chip Device Fabrication

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