18th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) 2011
DOI: 10.1109/ipfa.2011.5992753
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Fault localization using infra-red lock-in thermography for SOI-based advanced microprocessors

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Cited by 8 publications
(4 citation statements)
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“…Focus ion beam (FIB) was used to prepare the cross-section at the thermal emission site. A short was observed with metal layer damage and inter layer dielectric (ILD) crack filled with copper [13], as shown in Fig. 7.…”
Section: Lock-in Thermographymentioning
confidence: 92%
See 1 more Smart Citation
“…Focus ion beam (FIB) was used to prepare the cross-section at the thermal emission site. A short was observed with metal layer damage and inter layer dielectric (ILD) crack filled with copper [13], as shown in Fig. 7.…”
Section: Lock-in Thermographymentioning
confidence: 92%
“…7. ILD layer crack filled with copper causing the short [13] As mentioned above, another nondestructive die level failure analysis tool is magnetic field imaging technique, which has two major implementations: magnetic current imaging (MCI) for localization of shorts and leakages [14] and space domain reflectometry (SDR) for localization of open defects [15]. In most systems, field produced by alternating current is sent through a lock-in amplifier to reduce noise.…”
Section: Lock-in Thermographymentioning
confidence: 99%
“…Silicon is transparent to wavelengths above 1100 nm. It is therefore possible to detect hot spots using IR sensors, through the backside of DUTs [7]. One of the challenges in IR thermography is compensating for natural emissivity of materials.…”
Section: Light Emission From Above 0 • K Bodiesmentioning
confidence: 99%
“…Infra-Red (IR) thermography has proven to be efficient in detecting small defects in ICs [7]. It has also demonstrated to be efficient, by simulation only, for Trojan identification in [8].…”
Section: Introductionmentioning
confidence: 99%