3rd Electronics System Integration Technology Conference ESTC 2010
DOI: 10.1109/estc.2010.5642888
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Fan-Out Wafer-Level Packaging with highly flexible design capabilities

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Cited by 42 publications
(4 citation statements)
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“…Refs. [19,20], one of the challenges of chip-first (either die faceup or face-down) FOWLP and the key reasons for them to introduce the chip-last or RDL-first FOWLP is the production yield during the RDL process is low because the KGDs are already embedded. This is true only if the chip-last (RDL-first) FTI is fully functionally tested before the chip-to-wafer bonding.…”
Section: Reasons For Chip-last or Rdl-first According Tomentioning
confidence: 99%
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“…Refs. [19,20], one of the challenges of chip-first (either die faceup or face-down) FOWLP and the key reasons for them to introduce the chip-last or RDL-first FOWLP is the production yield during the RDL process is low because the KGDs are already embedded. This is true only if the chip-last (RDL-first) FTI is fully functionally tested before the chip-to-wafer bonding.…”
Section: Reasons For Chip-last or Rdl-first According Tomentioning
confidence: 99%
“…During IEEE/ESTC2010 and ECTC2011, NEC (now Renesas) presented a couple of papers on system in wafer-level package (SiWLP) [19], and "RDL-first" FOWLP [20]. These papers are based on their SMArt chip connection with feed through interposer packaging technology for interchip wide-band data transfer [21,22] and 3D stacked memory integrated on logic devices [23][24][25][26][27].…”
Section: Introductionmentioning
confidence: 99%
“…αρ αρ [4] interface the Represents 1 0 gas le compressib the Represents 0 gas le compressib the Represents 0…”
Section: Governing Equationsmentioning
confidence: 99%
“…RDL first process was first proposed by Yoichiro Kurita et al [4], which was invented to improve FO-WLP technology without RDL process yield loss. RDL first process flow, as shown in Fig.1, involved the following steps: (a) Sacrificial layer was deposited on glass wafer.…”
Section: Introductionmentioning
confidence: 99%