2017
DOI: 10.1039/c7tc00885f
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Facile patterning using dry film photo-resists for flexible electronics: Ag nanowire networks and carbon nanotube networks

Abstract: The Ag nanowire and CNT networks are patterned with a pattern width up to 30 μm by using dry film photo resists (DFRs). The systematic characterization of the electrical and mechanical properties of the patterned Ag nanowire networks revealed pattern width dependent property changes.

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Cited by 29 publications
(15 citation statements)
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“…However, the formation of ITO TEs requires a plasma-based sputtering process with a post-processing stage at high temperature, which causes severe damage to the adjacent active layers. Therefore, a number of alternatives to replace ITO, such as graphene, carbon nanotubes, conductive polymers, metal nanowires, nanofibers, and nanotroughs, have been intensively studied. Ag nanowires (AgNWs) are the most promising materials for flexible/stretchable devices owing to their excellent optoelectronic properties and mechanical reliability. In addition, their capabilities for large-scale synthesis and facile coating of large substrates make them attractive from a manufacturing perspective …”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…However, the formation of ITO TEs requires a plasma-based sputtering process with a post-processing stage at high temperature, which causes severe damage to the adjacent active layers. Therefore, a number of alternatives to replace ITO, such as graphene, carbon nanotubes, conductive polymers, metal nanowires, nanofibers, and nanotroughs, have been intensively studied. Ag nanowires (AgNWs) are the most promising materials for flexible/stretchable devices owing to their excellent optoelectronic properties and mechanical reliability. In addition, their capabilities for large-scale synthesis and facile coating of large substrates make them attractive from a manufacturing perspective …”
Section: Introductionmentioning
confidence: 99%
“…10−13 In addition, their capabilities for large-scale synthesis and facile coating of large substrates make them attractive from a manufacturing perspective. 14 The use of nanoscale materials has become more prevalent as techniques for their transfer between different substrates have been developed. 15−17 For example, the fabrication of graphene-based TEs in a roll-to-roll process became possible with the transfer technology of large-scale graphene on a Cu foil to a polymer substrate using a thermal release tape.…”
Section: Introductionmentioning
confidence: 99%
“…The main advantages of the photolithographic technique include producing patterns of various sizes and shapes with high precision, which enables one to design sophisticated and high-resolution micropatterns and engineer complex and multifunctional electronic devices. The well-established technique has been widely used to realize the patterns of MNWs with different feature sizes. , A typical photolithographic process of an MNWN contains five major steps: (i) coating a photoresist on the surface of the AgNW film; (ii) exposing the photoresist-coated AgNW film with a patterned photomask; (iii) developing a photoresist layer developed by using a proper solution; (iv) etching a nonpatterned area by the etchant solution; (v) fabricating the patterned AgNW network after striping the remaining photoresist layer. As shown in Figure a–c, AgNW patterns with line width ranging from 200 down to 20 μm were successfully fabricated using photolithography.…”
Section: Subtractive Patterning Methodsmentioning
confidence: 99%
“…In addition, the mechanical brittleness of ITO limits its use in flexible electronics [7,8]. To overcome these limitations, several ITO alternatives have been reported, including graphene [9,10], carbon nanotubes [11,12], metal meshes [13,14], and metal nanowires [15,16]. Among them, Ag nanowires are considered to be the most promising alternative because of their good optical and electrical performance, scalable synthesis, and ease of coating to form electrodes [17,18].…”
Section: Introductionmentioning
confidence: 99%