2004 10th International Workshop on Computational Electronics (IEEE Cat. No.04EX915)
DOI: 10.1109/group4.2004.1416657
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Facet preparation of SOI waveguides by etching and cleaving compared to dicing and polishing

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Cited by 6 publications
(3 citation statements)
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“…Therefore, other solutions for creating optical facets on PICs are being investigated. For instance, the optical facet can be realized using a two-step reactive ion-etch (RIE) process [29], where (i) a first etching step is used to fabricate high optical quality trenches through the SSCs and into the first few μm of the SOI surface and (ii) a coarser deep-etching step is used to create an approximately 80-100 μm deep trench into the SOI substrate to facilitate fiber access and positioning, as shown in Fig. 4.…”
Section: A Inverted Taper-based Solutionsmentioning
confidence: 99%
“…Therefore, other solutions for creating optical facets on PICs are being investigated. For instance, the optical facet can be realized using a two-step reactive ion-etch (RIE) process [29], where (i) a first etching step is used to fabricate high optical quality trenches through the SSCs and into the first few μm of the SOI surface and (ii) a coarser deep-etching step is used to create an approximately 80-100 μm deep trench into the SOI substrate to facilitate fiber access and positioning, as shown in Fig. 4.…”
Section: A Inverted Taper-based Solutionsmentioning
confidence: 99%
“…With the exception of asymmetric GRIN lens and surface gratings and mirrors, coupling methods often require that the coupling structure be precisely positioned relative to the coupling facet. Hence the development of lithographic methods for fabricating waveguide facets in precise register with the coupling structures is an essential step in solving the coupling problem, that has only been addressed by a small number of laboratories to date (42,43). This has been addressed in our lab (42) by the development of a double-etch process in which a 4 µm deep trench with optically smooth vertical sidewalls is formed first.…”
Section: Device Implementationmentioning
confidence: 99%
“…Several novel approaches for high efficiency coupling into submicron waveguides have been investigated. 6 We demonstrated a new method to prepare the end-facets of the SOI waveguides using femtosecond laser scoring. 7…”
Section: Introductionmentioning
confidence: 99%