Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications

Guerre, Roland; Hibert, C.; Burri, Y.; Flückiger, Ph.; Renaud, Philippe

doi:10.1016/j.sna.2005.02.039

Cited by 19 publications

(14 citation statements)

References 42 publications

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“…The insert losses of the assembled switch in the transmission and reflection states were 2.9 dB and 4.1 dB, respectively. Similar mirrors were also employed by Pan 71 and Guerre et al 72 for optical switching applications.…”

Section: Microprisms and Mirrorsmentioning

confidence: 86%

SU-8 for Microsystem Fabrication

Chiu

Cheng

2014

Photocured Materials

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SU-8 is a negative-tone photoresist that can be used to fabricate thick, high aspect ratio structures. The thickness of SU-8 structures ranges from several micrometers to several hundred micrometers or up to millimeters by direct spin coating or stacking of multiple layers of dry films. Being a negative resist, SU-8 can be used to fabricate complex three-dimensional structures such as sealed microchannels or tilted optical surfaces by multiple exposures. Another feature of SU-8 is that its properties can be controlled and modified during processes by the exposure doses, baking temperature, or even additives. This provides possibilities for novel device design and fabrication without complex fabrication processes. SU-8 has relatively low loss and absorption in the RF and visible spectral ranges, therefore, it has been used to fabricate various sensing, optical, and RF components and systems. This chapter summarizes the basic material properties and fundamental fabrication processes of SU-8. Examples of various structures, actuators, sensors, and fluidic/optical/RF components are presented to demonstrate the wide possibility of devices that can be implemented in SU-8.

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Section: Microprisms and Mirrorsmentioning

confidence: 86%

SU-8 for Microsystem Fabrication

Chiu

Cheng

2014

Photocured Materials

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“…Of particular interest for this project is the high aspect ratio (1:20) that can be achieved on thick layers in the order of 200 m (Figs. 3 and 4) with low roughness vertical sidewalls [10]. Moreover, its high level of resistance to radiation damage, comparable to Kapton film, makes it a good candidate for novel microfabricated radiation detectors [11].…”

Section: Prototype Detectorsmentioning

confidence: 99%

Scintillation particle detection based on microfluidics

Mapelli

Gorini

Haguenauer

et al. 2010

Sensors and Actuators A: Physical

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a b s t r a c t A novel type of particle detector based on scintillation, with precise spatial resolution and high radiation hardness, is being studied. It consists of a single microfluidic channel filled with a liquid scintillator and is designed to define an array of scintillating waveguides each independently coupled to a photodetector. Prototype detectors built using an SU-8 epoxy resin have been tested with electrons from a radioactive source. The experimental results show a light yield compatible with the theoretical expectations and confirm the validity of the approach.

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“…This approach, however, has limited the port count of optical switches. The use of planar waveguides in optical cross-connect architecture [6][7][8][9] has been proposed and implemented to increase port counts and reduce the freespace propagation loss. However, these approaches require relatively complex fabrication processes involving the realization of the waveguide and the MEMS switch in separate substrates, which introduce alignment issues.…”

Section: Introductionmentioning

confidence: 99%