Fabrication of sub 20-nm wide grooves in a quartz mold by space narrowing dry etching

Suzuki, Kenta; Youn, Sung-Won; Wang, Qing; Hiroshima, Hiroshi; Nishioka, Yasushiro

doi:10.1016/j.mee.2013.02.106

Cited by 5 publications

(4 citation statements)

References 17 publications

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“…By combining dry etching with advanced mask fabrication techniques, researchers have also produced 2D and 3D microstructure arrays on various mold materials. 2D structures, such as microgrooves [31], cylindrical arrays [32], and gratings [33] with vertical walls, have been fabricated by lithography and dry etching processes. To obtain 3D structures, researchers have also investigated novel methods by which to first produce 3D masks and then transfer them to the substrates via the dry etching process.…”

Section: Wet Etchingmentioning

confidence: 99%

A review of the techniques for the mold manufacturing of micro/nanostructures for precision glass molding

Zhou

Wang

et al. 2021

Int. J. Extrem. Manuf.

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Micro/nanostructured components play an important role in micro-optics and optical engineering, tribology and surface engineering, and biological and biomedical engineering, among other fields. Precision glass molding technology is the most efficient method of manufacturing micro/nanostructured glass components, the premise of which is meld manufacturing with complementary micro/nanostructures. Numerous mold manufacturing methods have been developed to fabricate extremely small and high-quality micro/nanostructures to satisfy the demands of functional micro/nanostructured glass components for various applications. Moreover, the service performance of the mold should also be carefully considered. This paper reviews a variety of technologies for manufacturing micro/nanostructured molds. The authors begin with an introduction of the extreme requirements of mold materials. The following section provides a detailed survey of the existing micro/nanostructured mold manufacturing techniques and their corresponding mold materials, including nonmechanical and mechanical methods. This paper concludes with a detailed discussion of the authors recent research on nickel-phosphorus (Ni-P) mold manufacturing and its service performance.

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Section: Wet Etchingmentioning

confidence: 99%

A review of the techniques for the mold manufacturing of micro/nanostructures for precision glass molding

Zhou

Wang

et al. 2021

Int. J. Extrem. Manuf.

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“…The major etchant gas CHF 3 supplies both the reactive etching species and the fluorocarbon (C x F y ) surface passivation layer-forming species. 37 To optimize the process, we systematically vary the radio frequency (RF) power, chamber pressure, and ratios of the etch gases (CHF 3 : O 2 : Ar) (Table S1 †). Our optimized etching conditions (Table S2 †) result in a high single-crystal TiO 2 etch rate of ∼40 nm min −1 at a sufficient etch selectivity of ∼14 : 1 over the Cr mask, which enables the formation of TiO 2 nanocylinders with vertical sidewalls (∼90°; Fig.…”

Section: Trifluoromethane (Chf 3 )-Based Plasma Etching Of Singlecrys...mentioning

confidence: 99%

Tunable top-down fabrication and functional surface coating of single-crystal titanium dioxide nanostructures and nanoparticles

Janissen

Ussembayev

et al. 2016

Nanoscale

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Titanium dioxide (TiO2) is a key component of diverse optical and electronic applications that exploit its exceptional material properties. In particular, the use of TiO2 in its single-crystalline phase can offer substantial advantages over its amorphous and polycrystalline phases for existing and yet-to-be-developed applications. However, the implementation of single-crystal TiO2 has been hampered by challenges in its fabrication and subsequent surface functionalization. Here, we introduce a novel top-down approach that allows for batch fabrication of uniform high-aspect-ratio single-crystal TiO2 nanostructures with targeted sidewall profiles. We complement our fabrication approach with a functionalization strategy that achieves dense, uniform, and area-selective coating with a variety of biomolecules. This allows us to fabricate single-crystal rutile TiO2 nanocylinders tethered with individual DNA molecules for use as force- and torque-transducers in an optical torque wrench. These developments provide the means for increased exploitation of the superior material properties of single-crystal TiO2 at the nanoscale.

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“…Lausecker et al reported the pattern transfer onto silicon substrates with a silicon nitride (SiN x ) layer showing a much higher etching durability than an imprint resist. 8) Cr, 9) CrN, 10) and Cr=Ta 11) with high etching durability have been widely used for dry etching. The critical issue of metal contamination, which degrades the properties of semiconductor devices, [12][13][14] should be considered.…”

Section: Introductionmentioning

confidence: 99%

Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography

Ito

Sato

Tasaki

et al. 2016

Jpn. J. Appl. Phys.

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We investigated the selection of bis(trimethylsilyl)phenyl-containing (meth)acrylates as additives to improve the durability to oxygen reactive ion etching (O2 RIE) of sub-50 nm imprint resist patterns suitable for bubble-defect-free UV nanoimprinting with a readily condensable gas. 2,5-Bis(2-acryloyloxyethoxy)-1,4-bis(trimethylsilyl)benzene, which has a diacrylate chemical structure similar to that of glycerol 1,3-diglycerolate diacrylate used as a base monomer, and 3-(2-methacryloyloxyethoxy)-1-(hydroxylethoxy)-2-propoxy-3,5-bis(trimethylsilyl)benzene, which has a hydroxy group similar to the base monomer, were synthesized taking into consideration the Ohnishi and ring parameters, and the oxidization of the trimethylsilyl moiety to inorganic species during O2 RIE. The addition of the latter liquid additive to the base monomer decreased etching rate owing to the good miscibility of the additive in the base monomer, while the addition of the former crystalline additive caused phase separation after UV nanoimprinting. The latter additive worked as a compatibilizer to the former additive, which is preferred for etching durability improvement. The coexistence of the additives enabled the fabrication of a 45 nm line-and-space resist pattern by UV nanoimprinting, and its residual layer could be removed by O2 RIE.

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Fabrication of sub 20-nm wide grooves in a quartz mold by space narrowing dry etching

Cited by 5 publications

References 17 publications

A review of the techniques for the mold manufacturing of micro/nanostructures for precision glass molding

A review of the techniques for the mold manufacturing of micro/nanostructures for precision glass molding

Tunable top-down fabrication and functional surface coating of single-crystal titanium dioxide nanostructures and nanoparticles

Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography

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