Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions

Abstract

We demonstrate a simple method to significantly improve the sharpness of standard silicon probes for an atomic force microscope or to repair a damaged probe. The method is based on creating and maintaining a strong, spatially localized electric field in the air gap between the probe tip and the surface of conductive sample. Under these conditions, nanostructure growth takes place on both the sample and the tip. The most likely mechanism is the decomposition of atmospheric adsorbate with subsequent deposition of carbon structures. This makes it possible to grow a spike of a few hundred nanometers in length on the tip. We further demonstrate that probes obtained by this method can be used for high-resolution scanning. It is important to note that all process operations are carried out in situ, in air and do not require the use of closed chambers or any additional equipment beyond the atomic force microscope itself.

Formation of vertical graphene on surface of the gallium-arsenide structures

“…Vertical mode gives the possibility to use very sharp probes for scanning of fragile and easy-deformable surfaces. In this study the scanning was carried out by cantilevers where thin " whiskers" were preliminary built-up following the procedure described in [10].…”

Two dynamic modes to streamline challenging atomic force microscopy measurements

“…We used different types of cantilevers with a force constant in the range of 0.5-50 N/m and resonant frequencies of 40-400 kHz. Some of the probes had sharp custom-made spikes grown according to [29].…”