2013
DOI: 10.1016/j.mssp.2012.06.017
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Fabrication of porous ZnO via electrochemical etching using 10wt% potassium hydroxide solution

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Cited by 14 publications
(5 citation statements)
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“…Recently, some attention has been paid to the synthesis of porous ZnO by using various methods such as thermal decomposition method, template assisted methods, hydrothermal method, solid-vapor process, radio frequency sputtering, electrochemical deposition, etc. [13][14][15]. To the best of our knowledge, an easy and economical method to prepare porous ZnO is not addressed so far.…”
Section: mentioning
confidence: 99%
“…Recently, some attention has been paid to the synthesis of porous ZnO by using various methods such as thermal decomposition method, template assisted methods, hydrothermal method, solid-vapor process, radio frequency sputtering, electrochemical deposition, etc. [13][14][15]. To the best of our knowledge, an easy and economical method to prepare porous ZnO is not addressed so far.…”
Section: mentioning
confidence: 99%
“…It is well known that OHcan attack and remove ZnO particles from ZnO surface. Due to slow reaction rate, fine structure is formed according relation [5]; From the Image-J analysis, it was found that pore density are 4.55, 5.92, 6.35 and 2.40 pore/µm 2 for immersing time of 0, 2, 4 and 6 min, respectively. These result indicated that larger pore density will support more dye loading in the treated films.…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, porous spaces of silicon [42,43], germanium [44], zinc oxide, etc. are obtained using a given method [45]. However, all these papers fail to provide a general idea about the mechanisms of formation of a porous layer during electrochemical treatment.…”
Section: Literature Review and Problem Statementmentioning
confidence: 99%