Fabrication of metallic oxide nanowires

Gaucher, F.; Pautrat, Alain; Autier-Laurent, S.; David, Christophe; Calvet, Laurie E.; Lecoeur, Ph.; Haghiri‐Gosnet, A. M.

doi:10.1016/j.mee.2008.12.095

Cited by 9 publications

(6 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Devices were patterned in a 3-step process via optical and electron beam lithography and ion beam etching, as described previously. 31 The different device characteristics are summarized in Table 1, and SEMs of two devices are shown in the insets of The AC current source could be varied between 250 nA and 1 mA. Other than Joule heating at large AC currents, the changes in the AC current source had no noticeable effect on the measurements.…”

Section: Methodsmentioning

confidence: 99%

Electron-electron interactions in nano-patterned La0.3Sr0.7MnO3 thin films

Calvet

Agnus

Lecoeur

2019

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

Understanding the transport in ultra-thin epitaxial La0.3Sr0.7MnO3 (LSMO) is a topic widespread current interest. Here we explore electron-electron interactions in low temperature magneto-transport in straight and zigzag nanowires fabricated from ultra-thin epitaxial LSMO films grown to different thicknesses on STO(100) substrates. We find that threedimensional electron-electron interactions can explain the resistivity upturn, including many of the changes observed with film thickness, nano-patterning, and magnetic field.

show abstract

Section: Methodsmentioning

confidence: 99%

Electron-electron interactions in nano-patterned La0.3Sr0.7MnO3 thin films

Calvet

Agnus

Lecoeur

2019

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

show abstract

“…An alternative process for the nanogaps would involve using the FOX as etch mask for a subsequent ion beam etch. 20 Using this scheme any electrode can be used including La x Sr 1−x MnO 3 contacts.…”

Section: Methodsmentioning

confidence: 99%

Assembly of Molecular Nanomagnets Into Nanogap Electrodes by Dielectrophoresis

Vaheb¹,

Le²,

Dia³

et al. 2012

j nanosci nanotechnol

View full text Add to dashboard Cite

We investigate the assembly of Prussian blue and Cs-Co-Cr Prussian blue analogue molecular nanomagnets into nano-patterned electrodes. Pd or Au gaps - 7-50 nm were fabricated on a SiO2/Si substrate using standard electron beam lithography and lift-off. Nanomagnets were positioned between the gaps via AC dielectrophoresis (DEP). At room temperature, the Cs-Co-Cr Prussian blue analogue nanoparticles exhibited negligible current whereas junction with Prussian blue nanoparticles exhibited - 30 pA at - 1 V.

show abstract

“…In this regard, appreciable progress has already been made by various groups in development of processes for LSMO patterning, etching, and metallization. [53][54][55] With film deposition process control also in place, LSMO-Si device structures for various applications can now be attempted using topdown or bottom-up patterning approaches.…”

Section: Implications For Device Applicationsmentioning

confidence: 99%

Morphology and Curie temperature engineering in crystalline La0.7Sr0.3MnO3 films on Si by pulsed laser deposition

Nori

Kale

Ganguly

et al. 2014

Journal of Applied Physics

View full text Add to dashboard Cite

Of all the colossal magnetoresistant manganites, La 0.7 Sr 0.3 MnO 3 (LSMO) exhibits magnetic and electronic state transitions above room temperature, and therefore holds immense technological potential in spintronic devices and hybrid heterojunctions. As the first step towards this goal, it needs to be integrated with silicon via a well-defined process that provides morphology and phase control, along with reproducibility. This work demonstrates the development of pulsed laser deposition (PLD) process parameter regimes for dense and columnar morphology LSMO films directly on Si. These regimes are postulated on the foundations of a pressure-distance scaling law and their limits are defined post experimental validation. The laser spot size is seen to play an important role in tandem with the pressure-distance scaling law to provide morphology control during LSMO deposition on lattice-mismatched Si substrate. Additionally, phase stability of the deposited films in these regimes is evaluated through magnetometry measurements and the Curie temperatures obtained are 349 K (for dense morphology) and 355 K (for columnar morphology)-the highest reported for LSMO films on Si so far. X-ray diffraction studies on phase evolution with variation in laser energy density and substrate temperature reveals the emergence of texture. Quantitative limits for all the key PLD process parameters are demonstrated in order enable morphological and structural engineering of LSMO films deposited directly on Si. These results are expected to boost the realization of top-down and bottom-up LSMO device architectures on the Si platform for a variety of applications.

show abstract

Fabrication of metallic oxide nanowires

Cited by 9 publications

References 15 publications

Electron-electron interactions in nano-patterned La0.3Sr0.7MnO3 thin films

Electron-electron interactions in nano-patterned La0.3Sr0.7MnO3 thin films

Assembly of Molecular Nanomagnets Into Nanogap Electrodes by Dielectrophoresis

Morphology and Curie temperature engineering in crystalline La0.7Sr0.3MnO3 films on Si by pulsed laser deposition

Contact Info

Product

Resources

About