Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

Sahoo, Kartika Chandra; Lin, Men Ku; Chang, Edward Yi; Lu, Yi; Chen, Chun‐Chi; Huang, Jin; Chang, Chun Wei

doi:10.1007/s11671-009-9297-7

Cited by 46 publications

(28 citation statements)

References 17 publications

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“…The PASiNP structure remarkably reduces the reflection of Si surface and demonstrates a low average reflection loss of ~2.84% (solid line in Fig. 3) within the same wavelength range, which is far lower than that of pristine Si wafer and previously developed Si micro-/nanostructures, as well as other ARCs [7,8,20,24-27]. In previous reports, the porous Si can reduce the reflection loss to ~5.8% within the wavelength range of 400–1,000 nm and therefore can replace other surface-textured microstructures [20,24-26].…”

Section: Resultsmentioning

confidence: 86%

Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Chen

et al. 2010

Nanoscale Res Lett

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Periodically aligned Si nanopillar (PASiNP) arrays were fabricated on Si substrate via a silver-catalyzed chemical etching process using the diameter-reduced polystyrene spheres as mask. The typical sub-wavelength structure of PASiNP arrays had excellent antireflection property with a low reflection loss of 2.84% for incident light within the wavelength range of 200–1,000 nm. The solar cell incorporated with the PASiNP arrays exhibited a power conversion efficiency (PCE) of ~9.24% with a short circuit current density (JSC) of ~29.5 mA/cm2 without using any extra surface passivation technique. The high PCE of PASiNP array-based solar cell was attributed to the excellent antireflection property of the special periodical Si nanostructure.

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Section: Resultsmentioning

confidence: 86%

Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Chen

et al. 2010

Nanoscale Res Lett

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“…PC1D software is commonly used for the interpreting experimental data to determine the structure of a device and provides the ability to display simulation results in the graph [10][11][12]. The efficiency of multi−crystalline silicon solar cells with a−Si:N:H antireflective coatings vs. various re− fractive index and thickness were simulated by using PC1D and software.…”

Section: Methodsmentioning

confidence: 99%

Properties of a-Si:N:H films beneficial for silicon solar cells applications

Swatowska

Stapiński

Zimowski

2012

Opto-Electronics Review

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Amorphous silicon-nitride thin films a-Si:N:H were obtained by plasma enhanced chemical vapour deposition (PECVD) method from SiH4+NH3 at 13.56 MHz. The process parameters were chosen to obtain the films of properties suitable for optoelectronic and mechanical applications. FTIR analysis of a-Si:N:H films indicated the presence of numerous hydrogen bonds (Si-H and N-H) which passivate structural defects in multicrystalline silicon and react with impurities. The morpho-logical investigations show that the films are homogeneous. The deposition of a-Si:N:H layers leads to the decrease in friction coefficient of used substrates. Optical properties were optimised to obtain the films of low effective reflectivity, large energy gap Eg from 2.4 to 2.9 eV and refractive index in the range of 1.9 to 2.2. Reduction of friction coefficient for monocrystalline silicon after covering with a-Si:N:H films was observed: from 0.25 to 0.18 for 500 cycles.

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“…However, these methods have the disadvantages of complexity, high cost and more pollution. Recently, periodic subwavelength scale structures have attracted considerable attention, due to their promising antireflection properties to minimize reflection losses [6][7][8]. However, they are expensive, only suitable for small area or flat surface applications.…”

Section: Introductionmentioning

confidence: 99%

Antireflection silicon structures with hydrophobic property fabricated by three-beam laser interference

Zhao

Wang

Zhang

et al. 2015

Applied Surface Science

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a b s t r a c tThis paper demonstrates antireflective structures on silicon wafer surfaces with hydrophobic property fabricated by three-beam laser interference. In this work, a three-beam laser interference system was set up to generate periodic micro-nano hole structures with hexagonal distributions. Compared with the existing technologies, the array of hexagonally-distributed hole structures fabricated by three-beam laser interference reveals a design guideline to achieve considerably low solar-weighted reflectance (SWR) in the wavelength range of 300-780 nm. The resulting periodic hexagonally-distributed hole structures have shown extremely low SWR (1.86%) and relatively large contact angle (140 • ) providing with a self-cleaning capability on the solar cell surface.

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Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

Cited by 46 publications

References 17 publications

Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Properties of a-Si:N:H films beneficial for silicon solar cells applications

Antireflection silicon structures with hydrophobic property fabricated by three-beam laser interference

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