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The thin layers of ZnO and ZnO: Al (Al doped zinc oxide—AZO) were deposited by the atomic deposition layer (ALD) method on silicon and glass substrates. The structures were deposited using diethylzinc (DEZ) and deionized water as zinc and oxygen precursors. A precursor of trimethylaluminum (TMA) was used to introduce the aluminum dopant. The present study of ALD-deposited ZnO and AZO films was motivated by their applications in photovoltaics. We attempted to expose several properties of such films. Structural, optical (including ellipsometric measurements) and electrical investigations were performed. We discussed the relations between samples doped with different Al fractions and their properties.

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Composite transparent electrodes based on carbon nanostructures such as multiwalled carbon nanotubes and graphene platelets were spray coated onto glass substrates and characterized by spectrophotometry and spectroscopic ellipsometry measurements. The dispersion relations of the ellipsometric angle rate, i.e. W and D versus wavelength k were measured in spectral range from 190 to 1700 nm. On the basis of these results, it was possible to estimate the value of the refractive index and extinction coefficient. Effective medium approximation model was chosen to calculate the optical constants of a mixed material. The average surface roughness and the average thickness of spray coated transparent resistive layers were also determined. The materials have a heterogeneous structure as confirmed by scanning electron microscopy and optical measurements (changes of depolarisation). From the Tauc plot it was possible to determine the energy gap. The influence of the coating process and the paint preparation on the optical properties was observed.

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