2021
DOI: 10.3390/instruments5040032
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Fabrication of a Hydrogenated Amorphous Silicon Detector in 3-D Geometry and Preliminary Test on Planar Prototypes

Abstract: Hydrogenated amorphous silicon (a-Si:H) can be produced by plasma-enhanced chemical vapor deposition (PECVD) of SiH4 (silane) mixed with hydrogen. The resulting material shows outstanding radiation hardness properties and can be deposited on a wide variety of substrates. Devices employing a-Si:H technologies have been used to detect many different kinds of radiation, namely, minimum ionizing particles (MIPs), X-rays, neutrons, and ions, as well as low-energy protons and alphas. However, the detection of MIPs u… Show more

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Cited by 12 publications
(11 citation statements)
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“…An advantageous feature of a-Si:H is its superior radiation hardness, with Wyrsch et al (2006) reporting an increase in the leakage current of a 32.6 μm a-Si:H p-i-n diode of only a factor of 2 when held at a 9 × 10 4 V cm −1 electric field and irradiated with 24 GeV protons up to a fluence of 7 × 10 15 p cm −2 . Furthermore, the radiation hardness and sensitivity of a-Si:H devices exposed to gamma irradiation has been reported (Boudry and Antonuk 1994, Kim et al 2002, Menichelli et al 2021. Detailed motivations behind the use of a-Si:H diodes for beam monitoring and dosimetry in high-dose environments is presented in full in Menichelli et al (2020).…”
Section: Introductionmentioning
confidence: 99%
“…An advantageous feature of a-Si:H is its superior radiation hardness, with Wyrsch et al (2006) reporting an increase in the leakage current of a 32.6 μm a-Si:H p-i-n diode of only a factor of 2 when held at a 9 × 10 4 V cm −1 electric field and irradiated with 24 GeV protons up to a fluence of 7 × 10 15 p cm −2 . Furthermore, the radiation hardness and sensitivity of a-Si:H devices exposed to gamma irradiation has been reported (Boudry and Antonuk 1994, Kim et al 2002, Menichelli et al 2021. Detailed motivations behind the use of a-Si:H diodes for beam monitoring and dosimetry in high-dose environments is presented in full in Menichelli et al (2020).…”
Section: Introductionmentioning
confidence: 99%
“…Compared to crystalline silicon, where 3D detectors have a p-n structure, a-Si:H detectors in this geometry have to be designed as a p-i-n structure (for the reasons described in the previous section). For this purpose, the 3D-SiAm group-which is a collaboration between several INFN units (Italy), EPFL (CH), and University of Wollongong (Australia)is designing a detector like the one shown in Figure 4, where the inter-electrode distance is about 30 µm and the thickness of the detector is in the order of 100 µm [5,26,27]. This detector works as follows.…”
Section: D A-si:h Particle Detectorsmentioning
confidence: 99%
“…A nonexhaustive list of materials where a-Si:H can be deposited can be found in Ref. [5]. Detector-grade a-Si:H can be deposited with various techniques, such as PECVD with plasma excitation at radio frequency (13.56 MHz) [6], at very high frequency (VHF; 27-150 MHz) [7] or at microwave frequencies [8], and the wellestablished hot-wire chemical vapor deposition (HWCVD) [9].…”
Section: Introductionmentioning
confidence: 99%
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“…A possible solution for these problems is a 3D detector geometry that allows to keep a relatively small inter-electrode distance (in the order of 25-30 µm) with detector thickness around 100 µm in order to increase the total charge generated in the detector by a MIP. The reduction of the distance between the electrodes is a crucial factor for keeping the leakage current low reducing the noise [5,6,7].…”
Section: Introductionmentioning
confidence: 99%