Fabrication and structural characterization of TiO nanoparticle soft-landed on substrate by the magnetron sputtering-gas aggregation method

Tanemura, Sakae; Kajino, Kiichi; Miao, Lijuan; Koide, Shigeyo; Tanemura, Masaki; Toh, Shoichi; Kaneko, Kenji; Mori, Miyuki

doi:10.1140/epjd/e2005-00123-8

Cited by 9 publications

(12 citation statements)

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“…Methods of ionization fall broadly into two categories, either continuous or pulsed. The most prevalent continuous ionization sources used for ion soft landing include electron impact ionization (EI) (Pradeep et al, ; Biesecker et al, ; Wijesundara et al, ; Bottcher et al, ), electrospray ionization (ESI) (Feng et al, ; Ouyang et al, ; Alvarez et al, ; Volny & Turecek, ; Mazzei et al, ; Hamann et al, ; Hauptmann et al, ), direct current (DC) or radiofrequency (RF) magnetron sputtering combined with gas aggregation (Haberland et al, , , ; Barnes et al, ; Pratontep et al, ; Tanemura et al, ; Lim et al, ; Duffe et al, ; Watanabe & Isomura, ; Gracia‐Pinilla et al, ; Nielsen et al, ; Wepasnick et al, ; Hartmann et al, ; Ludwig & Moore, ; Yin et al, ), high energy ion sputtering (Lapack et al, ; Harbich et al, ; Dong et al, ; Bromann et al, ; Fedrigo et al, ; Schaffner et al, ; O'Shea et al, ; Yamaguchi et al, ; Lau et al, ), and gas condensation/aggregation (GC) (Patil et al, ; Goldby et al, ; Yoon et al, ; Baker et al, ). Soft landing has also been accomplished using various pulsed ionization methods including matrix‐assisted laser desorption ionization (MALDI) (Rader et al, ), laser ablation/vaporization (Honea et al, ; Messerli et al, ; Pauwels et al, ; Klingeler et al, ; Heiz & Bullock, ; Melinon et al, ; Kemper et al, ; Mitsui et al, ; Winans et al, ; Cattaneo et al, ; Kaden et al, ; Davila et al, ; Tournus et al, ; Wepasnick et al, ; Woodward et al, ), the pulsed arc cluster ion source (PACIS) (Siekmann et al,…”

Section: Overview Of Instrumentation For Soft Landing Of Ionsmentioning

confidence: 99%

Soft‐ and reactive landing of ions onto surfaces: Concepts and applications

Johnson

Gunaratne

Laskin

2015

Mass Spectrometry Reviews

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Soft‐ and reactive landing of mass‐selected ions is gaining attention as a promising approach for the precisely‐controlled preparation of materials on surfaces that are not amenable to deposition using conventional methods. A broad range of ionization sources and mass filters are available that make ion soft‐landing a versatile tool for surface modification using beams of hyperthermal (<100 eV) ions. The ability to select the mass‐to‐charge ratio of the ion, its kinetic energy and charge state, along with precise control of the size, shape, and position of the ion beam on the deposition target distinguishes ion soft landing from other surface modification techniques. Soft‐ and reactive landing have been used to prepare interfaces for practical applications as well as precisely‐defined model surfaces for fundamental investigations in chemistry, physics, and materials science. For instance, soft‐ and reactive landing have been applied to study the surface chemistry of ions isolated in the gas‐phase, prepare arrays of proteins for high‐throughput biological screening, produce novel carbon‐based and polymer materials, enrich the secondary structure of peptides and the chirality of organic molecules, immobilize electrochemically‐active proteins and organometallics on electrodes, create thin films of complex molecules, and immobilize catalytically active organometallics as well as ligated metal clusters. In addition, soft landing has enabled investigation of the size‐dependent behavior of bare metal clusters in the critical subnanometer size regime where chemical and physical properties do not scale predictably with size. The morphology, aggregation, and immobilization of larger bare metal nanoparticles, which are directly relevant to the design of catalysts as well as improved memory and electronic devices, have also been studied using ion soft landing. This review article begins in section 1 with a brief introduction to the existing applications of ion soft‐ and reactive landing. Section 2 provides an overview of the ionization sources and mass filters that have been used to date for soft landing of mass‐selected ions. A discussion of the competing processes that occur during ion deposition as well as the types of ions and surfaces that have been investigated follows in section 3. Section 4 discusses the physical phenomena that occur during and after ion soft landing, including retention and reduction of ionic charge along with factors that impact the efficiency of ion deposition. The influence of soft landing on the secondary structure and biological activity of complex ions is addressed in section 5. Lastly, an overview of the structure and mobility as well as the catalytic, optical, magnetic, and redox properties of bare ionic clusters and nanoparticles deposited onto surfaces is presented in section 6. © 2015 Wiley Periodicals, Inc. Mass Spec Rev 35:439–479, 2016.

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Section: Overview Of Instrumentation For Soft Landing Of Ionsmentioning

confidence: 99%

Soft‐ and reactive landing of ions onto surfaces: Concepts and applications

Johnson

Gunaratne

Laskin

2015

Mass Spectrometry Reviews

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“…In order to fabricate nanoparticles of titanium dioxide, there is a large number of synthesis methods and studies, but there are only a few studies on the fabrication of TiO 2 nanoparticles with sputtering techniques [11,12]. All these methods provide the three crystalline phases, rutile, anatase and brookite, as well as an amorphous phase.…”

Section: Introductionmentioning

confidence: 99%

Optical properties of nanometric TiO2 clusters deposited on thin films by high pressure sputtering

Martínez-Morillas

Sánchez-Marcos

Andrés

et al. 2010

Surface and Coatings Technology

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“…Elemental mapping by electron spectroscopy imaging in the transmission electron microscope (ESI-TEM) is a microanalytical technique based on EEL spectrometry that has already provided much new information on particle chemical uniformity and topochemistry [14][15][16] complexities in different particles and it can now provide analytical information with atomic resolution [17,18].…”

Section: Introductionmentioning

confidence: 99%