2017
DOI: 10.1002/adem.201700532
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Fabrication and Optical Properties of Periodic Ag Nano‐Pore and Nano‐Particle Arrays with Controlled Shape and Size over Macroscopic Length Scales

Abstract: A facile and economical route to preparation of highly ordered sliver pore or particle arrays with controlled pore‐shape and size extended over cm2 areas is described. The substrates are prepared at planar and curved surfaces via sphere‐imprinted polymer (PDMS) templating using polystyrene spheres with diameters of 820, 600, or 430 nm. Nano‐pore arrays are created by sputtering 80 nm of Ag directly onto the templates and nano‐particle arrays are prepared by electrode‐less deposition of Ag from Tollen's reagent… Show more

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Cited by 10 publications
(3 citation statements)
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“…Patterns on the surface of PDMS are another effective way for fabricating SERS‐active substrates. Silicon wafer with certain pattern, [ 17 ] highly ordered anodic aluminum oxide (AAO), [ 22,67 ] plant leaves, [ 68 ] assembled polystyrene spheres, [ 69 ] sapphire substrates, [ 70 ] digital video disk, [ 71 ] and even sandpaper [ 72 ] can be used as templates to prepare PDMS substrates with the multiscale surface. As illustrated by Figure , zigzag micropattern was first designed by UV photolithography on a silicon wafer, then the mixture of PDMS monomer and curing agent were poured on the above substrates.…”
Section: Fabrication Of Flexible Sers Substratementioning
confidence: 99%
“…Patterns on the surface of PDMS are another effective way for fabricating SERS‐active substrates. Silicon wafer with certain pattern, [ 17 ] highly ordered anodic aluminum oxide (AAO), [ 22,67 ] plant leaves, [ 68 ] assembled polystyrene spheres, [ 69 ] sapphire substrates, [ 70 ] digital video disk, [ 71 ] and even sandpaper [ 72 ] can be used as templates to prepare PDMS substrates with the multiscale surface. As illustrated by Figure , zigzag micropattern was first designed by UV photolithography on a silicon wafer, then the mixture of PDMS monomer and curing agent were poured on the above substrates.…”
Section: Fabrication Of Flexible Sers Substratementioning
confidence: 99%
“…Several types of techniques using e.g. lithographic masking 3644 , stenciling 45,46 , and bottom-up masking 4753 have been used to produce a wide range of nanostructuring. It is in this context that we investigate here the combination of electron beam (ebeam) lithography-derived masking and tilted, rotated thermal evaporation with lift-off processing for the novel fabrication of an assortment of metallic nanostructures having rotational symmetry with specific topographies and sizes depending on the particular lithographic mask dimensions and the rotation tilt angle employed during the evaporation.…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, these films have been used as super-hydrophobic substrates, size-selective membranes, templates for catalytic reactions or cell growth, photonic crystal films, photodetectors, photovoltaic devices, and optical sensors. To date, the breath figure and replication methods are suggested to prepare the porous films. Breath figure methods produce pores by condensing water on the substrate surface, where solvents in the solvent–polymer mixtures are evaporated. ,,, , Replication methods embed replicating components into either colloidal crystal monolayers or master templates having certain geometries and the porous structures are obtainable after removing the templates. ,,,, , , Regardless of the preparation method, pore diameter is one of the important factors that determine the characteristics of the films. The breath figure method controls the pores by introducing humidity conditions and using different volumes of casting hydrophobic polymers. Although the replication methods mostly modulate the pore diameters by using colloids of different sizes, other methods have also been suggested.…”
Section: Introductionmentioning
confidence: 99%