2018
DOI: 10.1007/s13204-018-0806-9
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Fabrication and characterization of multi-stopband Fabry–Pérot filter array for nanospectrometers in the VIS range using SCIL nanoimprint technology

Abstract: Miniaturization of optical spectrometers can be achieved by Fabry-Pérot (FP) filter arrays. Each FP filter consists of two parallel highly reflecting mirrors and a resonance cavity in between. Originating from different individual cavity heights, each filter transmits a narrow spectral band (transmission line) with different wavelengths. Considering the fabrication efficiency, plasma enhanced chemical vapor deposition (PECVD) technology is applied to implement the high-optical-quality distributed Bragg reflect… Show more

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Cited by 11 publications
(20 citation statements)
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“…Nanoimprint technology is able to mold the whole cavity structure of millions of pixels, and the mold/template can be replicated and reused several times. Theoretically, there is no limit to the number of pixels that can be fabricated in a single cavity layer imprint step [ 32 , 33 , 34 , 35 , 36 ], in contrast to alternative technologies [ 27 , 28 , 29 , 30 ]. In a batch process many FP filter arrays can be imprinted at the same time, potentially resulting in substantial cost reduction.…”
Section: Role Of Nanoimprint For the Five Methodologies Comparedmentioning
confidence: 99%
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“…Nanoimprint technology is able to mold the whole cavity structure of millions of pixels, and the mold/template can be replicated and reused several times. Theoretically, there is no limit to the number of pixels that can be fabricated in a single cavity layer imprint step [ 32 , 33 , 34 , 35 , 36 ], in contrast to alternative technologies [ 27 , 28 , 29 , 30 ]. In a batch process many FP filter arrays can be imprinted at the same time, potentially resulting in substantial cost reduction.…”
Section: Role Of Nanoimprint For the Five Methodologies Comparedmentioning
confidence: 99%
“…Next, the 3D cavity layer is defined by a single 3D nanoimprint step, followed by deposition of a specific Si 3 N 4 protection layer that also acts as the first quarter-wave layer of the top DBRs. The tricky technology involved for this protection layer is reported in [ 36 ]. Then, negative photoresist is used again to cover distinct parts of the samples (including three bottom DBRs, the 3D cavity layer, and the protection layer) and precisely structure the blank deposition areas before depositing top DBR 1.…”
Section: Static Fp Filter Array Fabrication In the Vis Spectral Ramentioning
confidence: 99%
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