2019
DOI: 10.1007/s13204-019-01226-8
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Fabrication and characteristics of back-gate black phosphorus effect field transistors based on PET flexible substrate

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Cited by 6 publications
(4 citation statements)
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“…[57] The achieved mobility is slightly lower than that is typically reported in the literature for similar devices with thinner BP [58][59][60][61] while mobilities up to a factor 5 higher have been reported for BP on a high-k gate dielectric. [62,63] As the BP channel had limited exposure to air during both the fabrication and measurement process, the mobility is mainly affected by interfacial and intrinsic defects as well as the number of layers.…”
Section: Transistor Characterizationmentioning
confidence: 99%
“…[57] The achieved mobility is slightly lower than that is typically reported in the literature for similar devices with thinner BP [58][59][60][61] while mobilities up to a factor 5 higher have been reported for BP on a high-k gate dielectric. [62,63] As the BP channel had limited exposure to air during both the fabrication and measurement process, the mobility is mainly affected by interfacial and intrinsic defects as well as the number of layers.…”
Section: Transistor Characterizationmentioning
confidence: 99%
“…At ≈20 °C, single‐ or FL‐BP exhibit high current switching ratios and layer‐dependent band gaps, which easily detect targeted analytes by monitoring changes in conductance/resistance and are extensively studied in biomolecule and gas detection. [ 30 ] The molar response coefficient of BP, which reflects the inherent sensing capacity of the same amount of molecules, is ≈20‐fold higher than those of MoS 2 and graphene. [ 31 ] LDBP is now critical in chemical and biological sensing due to its larger adsorption sites and excellent electronic characteristics.…”
Section: Structures and Propertiesmentioning
confidence: 99%
“…Scaling leads to undesirable short channel effects (SCEs) and parasitic capacitances in a MOS device which make it unsuitable for RF application. To overcome these effects, 3D structures based on silicon such as FinFETs [1][2][3], gate-all-around FinFET and FETs [4][5][6], and other multi-gate FETs have been developed [7,8]. In recent years different materials have been introduced in nanochannel transistors, which exhibit better performance.…”
Section: Introductionmentioning
confidence: 99%