Extreme ultraviolet-induced photoionized plasmas

Bartnik, A.; Wachulak, P.; Fiedorowicz, Henryk; Fok, Tomasz; Jarocki, R.; Szczurek, M.

doi:10.1088/0031-8949/2014/t161/014061

Cited by 16 publications

(15 citation statements)

References 23 publications

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“…Most of the experiments were devoted to spectral inves− tigations of neon photoionized plasmas [13,[56][57][58]. The investigations were performed for different power densities and spectral distribution of incident radiation.…”

Section: Photoionized Plasmasmentioning

confidence: 99%

“…4), resulted in presence of multiple charged Ne ions up to Ne IV [13,61]. However, relative intensities of spectral lines corre− sponding to Ne III and Ne IV ions were over 20 times smaller comparing to the most intense Ne II lines, they were clearly visible.…”

Section: Photoionized Plasmasmentioning

confidence: 99%

“…In such cases low or moderate energy lasers working at 10 Hz or lower repetition rate are employed [10][11][12][13]. SXR or EUV sources based on such lasers are equipped with specialized collectors allow− ing for efficient focusing of the radiation to a spot with dimensions comparable to the plasma size.…”

Section: Introductionmentioning

confidence: 99%

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Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Bartnik

2015

Opto-Electronics Review

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In this work a review of investigations concerning interaction of intense extreme ultraviolet (EUV) and soft X-ray (SXR) pulses with matter is presented. The investigations were performed using laser-produced plasma (LPP) EUV/SXR sources based on a double stream gas puff target. The sources are equipped with dedicated collectors allowing for efficient focusing of the EUV/SXR radiation pulses. Intense radiation in a wide spectral range, as well as a quasi-monochromatic radiation can be produced. In the paper different kinds of LPP EUV/SXR sources developed in the Institute of Optoelectronics, Military University of Technology are described.Radiation intensities delivered by the sources are sufficient for different kinds of interaction experiments including EUV/SXR induced ablation, surface treatment, EUV fluorescence or photoionized plasma creation. A brief review of the main results concerning this kind of experiments performed by author of the paper are presented. However, since the LPP sources cannot compete with large scale X-ray sources like synchrotrons, free electron lasers or high energy density plasma sources, it was indicated that some investigations not requiring extreme irradiation parameters can be performed using the small scale installations. Some results, especially concerning low temperature photoionized plasmas are very unique and could be hardly obtained using the large facilities.

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Section: Photoionized Plasmasmentioning

confidence: 99%

Section: Photoionized Plasmasmentioning

confidence: 99%

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Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Bartnik

2015

Opto-Electronics Review

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“…At high power levels and intensities, this photoionization creates a plasma[1] [3]. The physics and effects of these plasma are still an open area of research.…”

Section: Motivation For a New Facilitymentioning

confidence: 99%

A new mask exposure and analysis facility

et al. 2014

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The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

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“…Photoionized plasmas were created by EUV irradiation of small portions of gases injected into the interaction region synchronously with the radiation pulse. A laser plasma EUV source based on a 10 J/ 10 ns Nd:YAG laser system and equipped with a multifoil [5] or ellipsoidal [6] EUV collector was employed for the gas irradiation. Measurements of emission and absorption spectra for photoionized plasmas created this way were performed.…”

Section: Introductionmentioning

confidence: 99%