1987
DOI: 10.1366/0003702874448823
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Extraction Discharge Source for Enhancing Analyte Line Intensities in Inductively Coupled Plasma Atomic Emission Spectrometry

Abstract: A supplementary electrical discharge is generated by extraction of the axial channel of an Ar inductively coupled plasma (ICP) into a small vacuum chamber. The spectral background levels and background noise emitted by this discharge are similar to those from the ICP alone. The discharge enhances the intensities of ion lines by factors of up to 13 relative to intensities observed from the ICP alone. Neutral atom lines from elements with high ionization energies (≤9 eV) are also enhanced but by less than ion li… Show more

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Cited by 17 publications
(7 citation statements)
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“…The emitted radiation is measured from this discharge and an enhancement in the signal is observed for some lines. 129 A general signal depression is produced in the presence of 1000 and 5000 mg ml 21 . In summary, it can be stated that the matrix effects were more pronounced with this device than with a normally observed ICP.…”
Section: Effect Of the Plasma Observation Modementioning
confidence: 97%
“…The emitted radiation is measured from this discharge and an enhancement in the signal is observed for some lines. 129 A general signal depression is produced in the presence of 1000 and 5000 mg ml 21 . In summary, it can be stated that the matrix effects were more pronounced with this device than with a normally observed ICP.…”
Section: Effect Of the Plasma Observation Modementioning
confidence: 97%
“…Several groups also investigated the plasma region itself, [9][10][11][12][13][14][15][16][17] but without comparison of plasma characteristics in the presence of the interface to the same characteristics in the absence of the interface. On the other hand, a detailed comparison of the plasma characteristics with and without sampling interface was performed by the groups of Houk, 18,19 Farnsworth 20 and Hieftje. 21 Ma et al 20 used laser induced fluorescence (LIF) to investigate the effect of the sampling interface on the analyte atom and ion distributions in the ICP, while Lehn et al 21 reported that the presence of the sampling interface causes changes in the fundamental plasma characteristics, such as electron number density and gas temperature.…”
Section: Experimental Investigationsmentioning
confidence: 99%
“…Figure18. Total Cu sample evaporation rate, integrated over the entire torch, as a function of the injector gas flow rate.…”
mentioning
confidence: 99%
“…Therefore optimization of its analytical performance is crucial. A number of studies have been performed for the effect of the presence of a mass spectrometer interface on ICPMS, [1][2][3][4][5][6][7][8] as well as for the effect of the ICP geometrical parameters (i.e., position and diameter of the sampler orice, as well as gas inlet diameter) on the plasma characteristics. [9][10][11][12][13][14][15][16] These observations all suggest that the use of an interface with different orice sizes signicantly affects the plasma characteristics.…”
Section: Introductionmentioning
confidence: 99%