2015
DOI: 10.1371/journal.pone.0119658
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Exploiting the Oxygen Inhibitory Effect on UV Curing in Microfabrication: A Modified Lithography Technique

Abstract: Rapid prototyping (RP) of microfluidic channels in liquid photopolymers using standard lithography (SL) involves multiple deposition steps and curing by ultraviolet (UV) light for the construction of a microstructure layer. In this work, the conflicting effect of oxygen diffusion and UV curing of liquid polyurethane methacrylate (PUMA) is investigated in microfabrication and utilized to reduce the deposition steps and to obtain a monolithic product. The conventional fabrication process is altered to control fo… Show more

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Cited by 25 publications
(39 citation statements)
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“…If upper surface of resin is covered by an impermeable or very low permeability material, a continuous inhibition takes place only by diffusion of oxygen from PDMS mold. The cross-linked PUMA in contact with the resin has no inhibitory effect related to oxygen diffusion (Alvankarian and Majlis 2015).…”
Section: Physics Of the Problemmentioning
confidence: 94%
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“…If upper surface of resin is covered by an impermeable or very low permeability material, a continuous inhibition takes place only by diffusion of oxygen from PDMS mold. The cross-linked PUMA in contact with the resin has no inhibitory effect related to oxygen diffusion (Alvankarian and Majlis 2015).…”
Section: Physics Of the Problemmentioning
confidence: 94%
“…The chemical compositions of UV-curable materials have ability to overcome the dissolved oxygen during cross-linking to a limited level and further diffusion of O 2 from the external and internal boundaries which have higher oxygen concentration than the resin itself delays the crosslinking or stops it from complete curing (Jeong 2008;Alvankarian and Majlis 2015). Therefore, in using PDMS mold and PUMA as the main substrate in micromolding, the high concentration of molecules of oxygen in resin has inhibitory effect on polymerization process.…”
Section: Physics Of the Problemmentioning
confidence: 99%
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