Experimental studies and limitations of the light trapping and optical losses in microcrystalline silicon solar cells

Berginski, M.; Hüpkes, J.; Gordijn, A.; Reetz, W.; Wätjen, Timo; Rech, Bernd; Wuttig, Matthias

doi:10.1016/j.solmat.2008.03.005

Cited by 75 publications

(36 citation statements)

References 22 publications

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“…These films are necessary to provide an electron-hole pair separation mechanism in the absorber layer, but they are also a source of parasitic absorption [1,2]. However, these layers can provide greater control over optical reflection if properly designed.…”

Section: Introductionmentioning

confidence: 99%

Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers

et al. 2016

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The use of hexamethyldisiloxane (HMDSO) as an oxygen source for the growth of p-type siliconbased layers deposited by Plasma Enhanced Chemical Vapor Deposition is evaluated. The use of this source led to the incorporation of almost equivalent amounts of oxygen and carbon, resulting in microcrystalline silicon oxycarbide thin films. The layers were examined with characterisation techniques including Spectroscopic Ellipsometry, Dark Conductivity, Fourier Transform Infrared Spectroscopy, Secondary Ion Mass Spectrometry and Transmission Electron Microscopy to check material composition and structure. Materials studies show that the refractive indices of the layers can be tuned over the range from 2.5 to 3.85 (measured at 600 nm) and in-plane dark conductivities over the range from 10 −8 S/cm to 1 S/cm, suggesting that these doped layers are suitable for solar cell applications. The p-type layers were tested in single junction amorphous silicon p-i-n type solar cells.

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Section: Introductionmentioning

confidence: 99%

Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers

et al. 2016

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“…To achieve more efficient light trapping and higher current density in μc-Si:H, the parasitic absorption losses occurring at the back and front electrodes should be minimized by optimizing the back reflector configuration and/or the front electrode TCO material [26,27].…”

Section: The Application Of N-type Microcrystalline Silicon Oxide (μCmentioning

confidence: 99%

Remarkable progress in thin-film silicon solar cells using high-efficiency triple-junction technology

Kim¹,

Chung²,

Lee³

et al. 2013

Solar Energy Materials and Solar Cells

164

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“…Usually, textured surface can be achieved by wet chemical etching after sputtering deposition of AZO films. In most researches, diluted HCl with a concentration of 0.5% was used as the typical etchant for the formation of surface textured AZO films [11][12][13]. However, the etching process and surface morphology are difficult to control because of the high etching rate of HCl solution.…”

Section: Introductionmentioning

confidence: 99%

Light trapping properties of surface textured ZnO:Al films deposited at various working pressures

Wang

Ding

Jiang

et al. 2015

Ceramics International

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Experimental studies and limitations of the light trapping and optical losses in microcrystalline silicon solar cells

Cited by 75 publications

References 22 publications

Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers

Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers

Remarkable progress in thin-film silicon solar cells using high-efficiency triple-junction technology

Light trapping properties of surface textured ZnO:Al films deposited at various working pressures

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