“…arvi et al [4] used Si+Sc as a solvent to increase the carbon solubility, and using a traveling solvent method, they achieved a very high growth rate, although the low-temperature growth could not be realized. In the past, Berman et al [5] tried to use the decomposition of methyltrichlorosilane gas as the SiC source, and using a molten nickel intermediate, they reported 3C-SiC growth on a-SiC substrates at 1200-1300 C. Recently, Mauk et al [6] reported the low-temperature LPE, in which Al-Zn solution was used as a solvent for SiC solid source, and the Zn component was evaporated at 900-1200 C to leave SiC on 6H-SiC substrates. Jacquier et al [7] showed a dipping method practically operating in the temperature range of 1000-1200 C, in which Al-rich Al-Si solution was used as solvent for carbon dissolved from a carbon crucible.…”