Abstract:Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography J. Vac. Sci. Technol. B 31, 021605 (2013); 10.1116/1.4790655True three-dimensional proximity effect correction in electron-beam lithographyIn electron-beam lithography, electron scattering in the resist, and underlying substrate limits the control over feature sizes [M. Parikh, J. Vac. Sci. Technol. 19, 1275 (1981]. To correct for this effect, one applies the … Show more
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