2009
DOI: 10.1016/j.physb.2009.08.302
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Evidence of trapping levels and photoelectric properties of Cu3BiS3 thin films

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Cited by 32 publications
(18 citation statements)
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“…Numerous evaporation methods such as coevaporation, fast evaporation, thermal evaporation, and electron beam (EB) [21][22][23][24][25][26][27][28][29][30][31][32] have been employed for the deposition of Cu 3 BiS 3 thin films. Cu 3 BiS 3 thin films were deposited using two different attitudes:…”
Section: Vacuum-based Evaporation Deposition Methodsmentioning
confidence: 99%
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“…Numerous evaporation methods such as coevaporation, fast evaporation, thermal evaporation, and electron beam (EB) [21][22][23][24][25][26][27][28][29][30][31][32] have been employed for the deposition of Cu 3 BiS 3 thin films. Cu 3 BiS 3 thin films were deposited using two different attitudes:…”
Section: Vacuum-based Evaporation Deposition Methodsmentioning
confidence: 99%
“…The deposited Cu 3 BiS 3 thin film had a ptype conductivity, a high absorption coefficient ( [10 4 cm -1 ), and optical energy gap 1.41 eV, indicating Cu 3 BiS 3 had best property to perform as an absorber layer in PV solar cell. Furthermore, Mesa et al [22] deposited Cu 3 BiS 3 thin films by a two-step evaporation process on glass substrates. In the first stage, a Bi thin layer was deposited with a flux of about 1 Å /s, and in second stage Cu is evaporated keeping the flux of about 0.8 Å /s.…”
Section: Vacuum-based Evaporation Deposition Methodsmentioning
confidence: 99%
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