2009
DOI: 10.1016/j.jlumin.2009.04.101
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Evaluation of bandgap energy and carrier density of InN nanocolumns

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Cited by 4 publications
(12 citation statements)
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“…Uniform arrays of InGaN/GaN nanocolumns are fabricated by rf-plasma-assisted molecular beam epitaxy (rf-MBE) with the Ti-mask selective-area growth technique [7][8][9][10]. Micro-PL spectroscopy is performed on densely integrated nanocolumns with lattice constant of 200 nm at 20 K. The excitation laser wavelength is 390 nm.…”
Section: Resultsmentioning
confidence: 99%
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“…Uniform arrays of InGaN/GaN nanocolumns are fabricated by rf-plasma-assisted molecular beam epitaxy (rf-MBE) with the Ti-mask selective-area growth technique [7][8][9][10]. Micro-PL spectroscopy is performed on densely integrated nanocolumns with lattice constant of 200 nm at 20 K. The excitation laser wavelength is 390 nm.…”
Section: Resultsmentioning
confidence: 99%
“…Both uniform arrays of InGaN/GaN nanocolumns and individual single nanocolumns were fabricated by rfplasma-assisted molecular beam epitaxy (rf-MBE) with the Ti-mask selective-area growth technique. [15][16][17][18][19][20] A 5 nm Ti layer was evaporated on a GaN template. Using electron beam lithography and Ar dry etching techniques, hole patterns, which control the nanocolumn diameter, were formed.…”
Section: Experimental Methodsmentioning
confidence: 99%
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“…Nanocolumns are selectively formed one-dimensional columnar nitride nanocrystals, and have been intensively studied for light-emitting diode (LED) applications because of their highly tunable emission energy in the range of 400-1800 nm [1][2][3][4][5][6][7][8] and their high-density large-scale integration capability. Regularly arranged nanocolumns in a triangular lattice with a 300 nm lattice constant were reported in 2014, 7) and a monolithic integration of LEDs with an area of 150 × 150 µm 2 was realized.…”
Section: Introductionmentioning
confidence: 99%