EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Sugisaki, Katsumi; Hasegawa, Masanobu; Okada, Masashi; Zhu, Yongtian; Liu, Zhiqiang; Ishii, Mikihiko; Kawakami, Jun; Murakami, Katsuhiko; Saito, Jun; Kato, S.; Ouchi, Chidane; Ohkubo, Akinori; Sekine, Yoshiyuki; Hasegawa, Takayuki; Suzuki, Atsushi; Niibe, Masahito; Takeda, Mitsuo

doi:10.1007/3-540-29303-5_35

Cited by 4 publications

(4 citation statements)

References 14 publications

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“…It means that manufacturing technology and metrology should close the loop for form accuracy control on the subatomic level. Therefore, the manufacturing of the EUV mirrors is full of tough challenges, representing the highest level of ultraprecision machining in the contemporary era [59][60][61][62][63][64]. Table 1 lists some precision levels and manufacturing methods for typical applications.…”

Section: State-of-the-art Precision Levelmentioning

confidence: 99%

Manufacturing technologies toward extreme precision

Zhang

Yan

Kuriyagawa

2019

Int. J. Extrem. Manuf.

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Precision is one of the most important aspects of manufacturing. High precision creates high quality, high performance, exchangeability, reliability, and added value for industrial products. Over the past decades, remarkable advances have been achieved in the area of high-precision manufacturing technologies, where the form accuracy approaches the nanometer level and surface roughness the atomic level. These extremely high precision manufacturing technologies enable the development of high-performance optical elements, semiconductor substrates, biomedical parts, and so on, thereby enhancing the ability of human beings to explore the macro- and microscopic mysteries and potentialities of the natural world. In this paper, state-of-the-art high-precision material removal manufacturing technologies, especially ultraprecision cutting, grinding, deterministic form correction polishing, and supersmooth polishing, are reviewed and compared with insights into their principles, methodologies, and applications. The key issues in extreme precision manufacturing that should be considered for future R&D are discussed.

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Section: State-of-the-art Precision Levelmentioning

confidence: 99%

Manufacturing technologies toward extreme precision

Zhang

Yan

Kuriyagawa

2019

Int. J. Extrem. Manuf.

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“…A wavefront sensing team of Japanese EUVA project has demonstrated wavefront evaluation of EUV imaging optics with sub-nanometer accuracy 10 . A wavefront sensing team of Japanese EUVA project has demonstrated wavefront evaluation of EUV imaging optics with sub-nanometer accuracy 10 .…”

Section: Phase Detection For Sub-nanometer Wavefront Evaluation For Ementioning

confidence: 99%

Measurements of Extreme Physical Phenomena by Fourier Fringe Analysis

Takeda¹,

Rastogi²,

Hack³

2010

AIP Conference Proceedings

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“…The alignment of such PO must be performed at-wavelength with a measurement accuracy of 0.1nm rms 1 . Among the interferometers developed to facilitate the at-wavelength alignment of EUVL PO, the PS/PDI 2,3 has demonstrated the highest measurement accuracy of 0.04~0.08nm rms [4][5][6] .…”

Section: Introductionmentioning

confidence: 99%

Design optimization of phase-shifting point diffraction interferometer

Liu

2008

SPIE Proceedings

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The phase-shifting point diffraction interferometer (PS/PDI) is so far the most accurate measurement tool in atwavelength interferometry of projection optics for extreme ultraviolet lithography (EUVL). The complicate interrelationships between configuration parameters of PS/PDI call for an optimization to achieve high accuracy of PS/PDI. In this paper, a novel system-level modeling approach is proposed to optimize the parameters of PS/PDI designed for visible light (λ=632.8nm) concept proof experiment. The optimal reference pinhole size selection is performed by modeling pinhole spatial filtering effect using Diffraction-Based Beam Propagation (BPR) module of CODE V and in house software. The result shows that various pinhole diameters ranging from 1.6um to 2.2um should be used in our PS/PDI experiment. The test window size and grating duty cycle optimization, which is based on the spatial frequency domain analysis of PS/PDI, is conducted by modeling the entire PS/PDI system using Physical Optics Propagation (POP) module of Zemax and in house software. The optimal window size is approximately 62um for a given window-pinhole separation of 63.3um. The optimal duty cycle of grating is calculated to be 83% to obtain the maximum fringe contrast of 0.879.

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EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Cited by 4 publications

References 14 publications

Manufacturing technologies toward extreme precision

Manufacturing technologies toward extreme precision

Measurements of Extreme Physical Phenomena by Fourier Fringe Analysis

Design optimization of phase-shifting point diffraction interferometer

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