EUV multilayer optics

Feigl, Torsten; Yulin, Sergiy; Benoît, Nicolas; Kaiser, Norbert

doi:10.1016/j.mee.2005.12.033

Cited by 51 publications

(29 citation statements)

References 7 publications

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“…The source can be applied as a compact EUV lamp for EUV metrology purposes. An application of the source for the optical characterization of Mo/Si multi-layer mirrors [20][21][22][23][24][25][26] was previously reported [27]. Besides the EUV metrology, the laser-produced plasma source with the Xe/He gas-puff target has been successfully used in photo-etching of polymers [28,29].…”

Section: Introductionmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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The paper describes a debris-free, efficient laserproduced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its properties and spectroscopic signatures are characterized and discussed. The spatio-spectral features of the EUV emission are investigated. We show a large body of results related to the intensity and brightness of the EUV emission, its spatial, temporal, and angular behavior and the effect of the repetition rate as well. A conversion efficiency of laser energy into EUV in-band energy at 13.5 nm of 0.42% has been gained. The electron temperature and electron density of the source were estimated by means of a novel method using the FLY code. The experimental data and the Hullac code calculations are compared and discussed. The source is well suited for EUV metrology purposes. The potential of the source for R. Rakowski ( ) ·

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Section: Introductionmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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“…This scheme has been extensively applied in the soft x-ray and EUV region to increase both the angular and wavelength bands. [32][33][34][35][36][37][38] Note that the increase of the reflection bandwidth is unavoidably connected to a decrease of the maximum reflectivity, due to the fact that the layer thicknesses do no longer perfectly match the interference conditions. Furthermore, the absorption in the layers can be enhanced for different wavelengths/angles.…”

Section: B Broadband Multilayer Mirrormentioning

confidence: 99%

“…An even larger angle range from 0 to 20 is possible although that resulted in a reduction of the reflectivity to about 30%-36%. 34,35 A realistic layer structure has to be taken into account during the design of such a broadband multilayer, including interlayer formation, a variation of the layer density, effects of local crystallization, etc, in order to achieve the desired optical response. 37 Among these factors, the naturally formed interlayer between the main pair of constituent materials is a dominant issue.…”

Section: B Broadband Multilayer Mirrormentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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“…Extreme-Ultra-Violet (EUV) multilayer mirror [21], we have realized at FLASH a focal spot of 3 µm in diameter at a wavelength of 13.3 nm, i.e. the photon energy of 93 eV [12].…”

Section: Strong-field Phenomenamentioning

confidence: 99%

“…At the photon energy of 93 eV, we have achieved, e.g., irradiance levels of up to 10 16 W cm -2 with the aid of an Extreme Ultra-Violet (EUV) multilayer mirror [21]. Our work on free atoms and molecules refers to the fundamental aspects of photon-matter interaction but might be of significance for any investigation at current and future X-ray laser facilities on fields like plasma physics, new materials, femtochemistry, and biochemical structure and dynamics.…”

Section: Introductionmentioning

confidence: 99%

Nonlinear photoionization in the soft X-ray regime

et al. 2008

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At the new Free-electron LASer in Hamburg FLASH, we have studied photon-matter interaction by means of ion time-of-flight spectroscopy on gases in the soft X-ray regime. Emphasis was laid on the quantitative investigation of non-linear effects upon photoionization by the highly intense soft X-ray laser pulses. In the photon energy range from 38 to 93 eV, we have observed non-linearities due to space-charge effects, target depletion, and sequential and direct multi-photon ionization at irradiance levels of up to 10 16 W cm -2 . The work is related to the development of photon diagnostic tools that are based on gas-phase photoionization for current and future X-ray laser facilities but might be of significance for any experiment at fourth generation light sources.

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EUV multilayer optics

Cited by 51 publications

References 7 publications

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Nonlinear photoionization in the soft X-ray regime

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