Erosion of Kapton H® by Hyperthermal Atomic Oxygen

Buczala, Deanna M.; Brunsvold, Amy L.; Minton, Timothy K.

doi:10.2514/1.16402

Cited by 67 publications

(93 citation statements)

References 16 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…A detailed description of the sample mount can be found in an earlier paper (26). Nine samples can be exposed simultaneously.…”

Section: Articlementioning

confidence: 99%

“…The exposure experiment was conducted in the source region of a molecular beam apparatus (26)(27)(28)(29)(30) (32), and that the O 2 molecules in the beam are in their O 2 ( 3 Σ g -) ground state (33). These results establish that the exposure environment used in our laboratory subjects materials to groundstate O and O 2 .…”

Section: Exposures and Erosion-depth Measurementsmentioning

confidence: 99%

See 1 more Smart Citation

Erosion of FEP Teflon and PMMA by VUV Radiation and Hyperthermal O or Ar Atoms

Zhang

Lindholm

Brunsvold

et al. 2009

ACS Appl. Mater. Interfaces

Self Cite

View full text Add to dashboard Cite

A combination of beam-surface-scattering, quartz-crystal-microbalance, and surface-recession experiments was conducted to study the effects of various combinations of O atoms [in the O((3)P) ground state], Ar atoms, and vacuum ultraviolet (VUV) light on fluorinated ethylene-propylene copolymer (FEP) Teflon and poly(methyl methacrylate) (PMMA). A laser-breakdown source was used to create hyperthermal beams containing O and O(2) or Ar. A D(2) lamp provided a source of VUV light. O atoms with 4 eV of translational energy or less did not react with a pristine FEP Teflon surface. Volatile O-containing reaction products were observed when the O-atom energy was higher than 4.5 eV, and the signal increased with the O-atom energy. Significant erosion of FEP Teflon ( approximately 20% of Kapton H) was observed when it was exposed to the hyperthermal O/O(2) beam with an average O-atom energy of 5.4 eV. FEP Teflon and PMMA that were exposed to VUV light alone exhibited much less mass loss. Collision-induced dissociation by hyperthermal Ar atoms also caused mass loss, similar in magnitude to that caused by VUV light. There were no observed synergistic effects when VUV light or Ar bombardment was combined with O/O(2) exposure. For both FEP Teflon and PMMA, the erosion yields caused by simultaneous exposure to O/O(2) and either VUV light or Ar atoms could be approximately predicted by adding the erosion yield caused by O/O(2), acting individually, to the erosion yield caused by the individual action of either VUV light or Ar atoms.

show abstract

“…A detailed description of the sample mount can be found in an earlier paper (26). Nine samples can be exposed simultaneously.…”

Section: Articlementioning

confidence: 99%

Section: Exposures and Erosion-depth Measurementsmentioning

confidence: 99%

Erosion of FEP Teflon and PMMA by VUV Radiation and Hyperthermal O or Ar Atoms

Zhang

Lindholm

Brunsvold

et al. 2009

ACS Appl. Mater. Interfaces

Self Cite

View full text Add to dashboard Cite

show abstract

“…The difference in etch depth between the eroded and stainless steel screen-protected areas of the samples, made it possible to calculate an AO reaction efficiency (R e ) or erosion yield of the material for a given AO flux. [29] The AO reaction efficiency of the Kapton H ® reference sample was used to calculate the Kapton ® equivalent fluence and erosion yields of each sample exposure. [29] For various exposures, the step heights (or etch depths) of POSS-PI films were plotted as a function of the step height of the Kapton H ® film.…”

Section: Resultsmentioning

confidence: 99%

“…[29] The AO reaction efficiency of the Kapton H ® reference sample was used to calculate the Kapton ® equivalent fluence and erosion yields of each sample exposure. [29] For various exposures, the step heights (or etch depths) of POSS-PI films were plotted as a function of the step height of the Kapton H ® film. [23] The derivative functions indicated that the 3.5 and 7.0 wt % Si 8 This paper is declared a work of the U.S. Government and is not subject to copyright protection in the United States and increased in depth to 1.4 µm after the second exposure.…”

Section: Resultsmentioning

confidence: 99%

Synthesis and Characterization of Space-Survivable POSS-Kapton (Trademark) Polyimides (Preprint)

Tomczak¹,

Minton²,

Brunsvold³

et al. 2007

Self Cite

View full text Add to dashboard Cite

“…In this respect, satellites operating in low earth orbits are most vulnerable to optical degradation effects [4]. Efforts can be taken to mitigate degradation effects for commonly used spacecraft materials such as Kapton or MLI, which show severe degradation for long-time space exposure [5][6][7]. However, different materials are affected in different ways by exposure to the space environment and the magnitude of the effect depends on mission and spacecraft specific parameters.…”

Section: Introductionmentioning

confidence: 99%