2021
DOI: 10.1002/adfm.202100503
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Epitaxial Growth of 2D Materials on High‐Index Substrate Surfaces

Abstract: Recently, the successful synthesis of wafer-scale single-crystal graphene, hexagonal boron nitride (hBN), and MoS 2 on transition metal surfaces with step edges boosted the research interests in synthesizing wafer-scale 2D single crystals on high-index substrate surfaces. Here, using hBN growth on high-index Cu surfaces as an example, a systematic theoretical study to understand the epitaxial growth of 2D materials on various high-index surfaces is performed. It is revealed that hBN orientation on a high-index… Show more

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Cited by 21 publications
(34 citation statements)
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“…As illustrated in Fig. 68, due to the existence of step edges, a high-index surface owns very low C1 or Cs symmetry 1640,1655 . On such a substrate, the energetically most preferred orientations of a 2D material are not degenerated and, thus, uniformly aligned 2D islands may be grown under the optimized experimental condition.…”
Section: Growth Mechanism Of 2d Materials Via Bottomup Synthesismentioning
confidence: 99%
See 3 more Smart Citations
“…As illustrated in Fig. 68, due to the existence of step edges, a high-index surface owns very low C1 or Cs symmetry 1640,1655 . On such a substrate, the energetically most preferred orientations of a 2D material are not degenerated and, thus, uniformly aligned 2D islands may be grown under the optimized experimental condition.…”
Section: Growth Mechanism Of 2d Materials Via Bottomup Synthesismentioning
confidence: 99%
“…Near a step edge, the alignment of a 2D material is determined by the interaction between the edge of the 2D material and the step edge of the substrate, or the interfacial formation energy 1655,1660 . Fig.…”
Section: Growth Mechanism Of 2d Materials Via Bottomup Synthesismentioning
confidence: 99%
See 2 more Smart Citations
“…In addition to the solution algorithms of the two standard methods, the wave front sensing method can also be used to evaluate the flatness error of micro/nano surface. Nutsch et al (2007) and Zhang et al (2021) improved the wave front sensing method proposed by Makyoh and Shack Hartmann and applied it to the flatness error evaluation of wafer surface.…”
Section: Related Workmentioning
confidence: 99%