Enhanced performance of solar cells with anti-reflection layer fabricated by nano-imprint lithography

Han, Ke; Shin, Ju Hyeon; Yoon, Woo Young; Lee, Heon

doi:10.1016/j.solmat.2010.04.064

Cited by 124 publications

(68 citation statements)

References 15 publications

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“…This modification increased the total conversion efficiency by 2.5% [93]. A moth-eye pattern also reduced reflectance and enhanced total conversion efficiency of a GaInP/Ga(In)As/Ge solar cell [94]. Finally, a moth-eye pattern, formed on the front surface of an amorphous silicon based thin-film solar cell using NIL, not only increased the total conversion efficiency by ∼3%, but also added a hydrophobic, and thus self-cleaning functionality [95].…”

Section: Range Of Applicationsmentioning

confidence: 96%

Material design and structural color inspired by biomimetic approach

Saitô

2011

Science and Technology of Advanced Materials

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Generation of structural color is one of the essential functions realized by living organisms, and its industrial reproduction can result in numerous applications. From this viewpoint, the mechanisms, materials, analytical methods and fabrication technologies of the structural color are reviewed in this paper. In particular, the basic principles of natural photonic materials, the ideas developed from these principles, the directions of applications and practical industrial realizations are presented by summarizing the recent research results.

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Section: Range Of Applicationsmentioning

confidence: 96%

Material design and structural color inspired by biomimetic approach

Saitô

2011

Science and Technology of Advanced Materials

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“…Both approaches focus the elevation of absorbing and harvesting the light of the Sun inside a solar cell. Our group has developed the fabrication process of anti-reflection nano-structure for solar cells using NIL [185][186][187][188][189][190][191][192]. The polymer-based moth-eye structures were formed on the protective layer of a thin film solar cell and on the top surface of a GaAs solar cell by UV NIL.…”

Section: Applications For Solar Cellsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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“…Nanoscale structures can be fabricated by various methods such as sol-gel methods, self-assembly, lithography and replication [15][16][17][18][19][20]. Among these, direct replication using a template is relatively easy, cost-effective, and applicable to various curable materials [21][22][23][24][25][26]. Anodic aluminum oxide (AAO) is widely used as a template for nanoscale structures since it has a large number of nanosized pores and micro-size height, which enable the fabrication of nanowires and nanotubes with a high aspect ratio [27][28][29][30].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Nano-Micro Hybrid Structures by Replication and Surface Treatment of Nanowires

et al. 2017

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Nanowire structures have attracted attention in various fields, since new characteristics could be acquired in minute regions. Especially, Anodic Aluminum Oxide (AAO) is widely used in the fabrication of nanostructures, which has many nanosized pores and well-organized nano pattern. Using AAO as a template for replication, nanowires with a very high aspect ratio can be fabricated. Herein, we propose a facile method to fabricate a nano-micro hybrid structure using nanowires replicated from AAO, and surface treatment. A polymer resin was coated between Polyethylene terephthalate (PET) and the AAO filter, roller pressed, and UV-cured. After the removal of aluminum by using NaOH solution, the nanowires aggregated to form a micropattern. The resulting structure was subjected to various surface treatments to investigate the surface behavior and wettability. As opposed to reported data, UV-ozone treatment can enhance surface hydrophobicity because the UV energy affects the nanowire surface, thus altering the shape of the aggregated nanowires. The hydrophobicity of the surface could be further improved by octadecyltrichlorosilane (OTS) coating immediately after UV-ozone treatment. We thus demonstrated that the nano-micro hybrid structure could be formed in the middle of nanowire replication, and then, the shape and surface characteristics could be controlled by surface treatment.

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Enhanced performance of solar cells with anti-reflection layer fabricated by nano-imprint lithography

Cited by 124 publications

References 15 publications

Material design and structural color inspired by biomimetic approach

Material design and structural color inspired by biomimetic approach

Recent progress in direct patterning technologies based on nano-imprint lithography

Fabrication of Nano-Micro Hybrid Structures by Replication and Surface Treatment of Nanowires

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