Recent progress in direct patterning technologies based on nano-imprint lithography

Abstract

Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

Demonstration of nanoimprinted hyperlens array for high-throughput sub-diffraction imaging

“…The hexagonal array of hole patterns is fabricated on the Cr-layered quartz substrate and the LOL by a direct printing technique at 0.5 MPa for 5 minutes. To use the HSQ patterns as a mask layer for the LOL and the Cr layer, a residual layer of the HSQ patterns is etched by a reactive ion etching (RIE) process under the following conditions: CF 4 , 18 sccm; O 2 , 2 sccm; and a 3.33 Pa pressure and 350 W of power applied for 1 minute37. Using the HSQ patterns as a mask layer, the lift-off layer is etched selectively using the RIE process under the following conditions: O 2 , 20 sccm, and a 2 Pa pressure with 150 W of power applied for 2 minutes38.…”

Template‐Assisted Fabrication of Nanostructured Arrays for Sensing Applications

“…Nanoimprint lithography is a promising patterning technology for fabricating nano‐ and micropatterns on various substrates because of its ease and accessible resolution below 10 nm . The patterning mechanism relies on mechanical deformation of samples accompanied by pressing into the nanoimprint mold.…”

Precursor strategies for metallic nano- and micropatterns using soft lithography

“…106,133 A crucial advantage of these methods is, that they can easily be transferred to roll-to-roll processes (R2R). 106,133 A crucial advantage of these methods is, that they can easily be transferred to roll-to-roll processes (R2R).…”