Enhanced discharge and surface properties of TiSiCN coatings deposited by pulse-enhanced vacuum arc evaporation

Ma, Yinghe; Yang, Jianguo; Tian, Xiubo; Gong, Chunzhi; Zheng, Wenjian; He, Yanming; Li, Huaxin; Gao, Zengliang; Zhang, Kexin; Wei, Lianfeng; Chu, Paul K.

doi:10.1016/j.surfcoat.2020.126413

Cited by 13 publications

(7 citation statements)

References 32 publications

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“…This reveals that high content of C is not conducive to the formation of Ti‐containing compounds. The N 1s spectra (Figure 3E) show three fitting peaks located at 397.5, 398.5 and 400.2 eV, which are assigned to the typical features of TiCN, Si 3 N 4 and CN x bonds, respectively 24–26 . This is consistent with the fitting results of Ti 2p, Si 2p, and C 1s spectra.…”

Section: Resultssupporting

confidence: 87%

Microstructure and tribological properties of TiSiCN composite coatings with different carbon contents deposited by plasma‐enhanced magnetron sputtering

Liu

Jin

Zhou

et al. 2023

Surface & Interface Analysis

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TiSiCN composite coatings with different C contents were prepared on Cr buffer layer by plasma‐enhanced magnetron sputtering. The structure, composition, surface, and cross‐sectional morphology of the coatings were characterized by X‐ray photoelectron spectroscopy, X‐ray diffraction, Raman spectroscopy, scanning electron microscope, and atomic force microscope. The hardness, elastic modulus, and tribological performance of the coatings were evaluated by nanoindentation and reciprocating friction tests. The results showed that the TiSiCN composite coatings are amorphous structure composed of TiCN compound and microcrystalline graphite, and amorphous phases. The increase of C content changed the content and distribution of TiCN ceramics nanocrystal, amorphous Si3N4 and amorphous carbon (sp3‐ and sp2‐hybridized C), thus affecting the hardness and friction behavior of the coatings. The hardness of the composite coatings was related to the content of TiCN phase and sp3‐C in the coatings. The TiSiCN composite coating with C content of 68.2% had lower coefficient of friction and the lowest wear rate.

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Section: Resultssupporting

confidence: 87%

Microstructure and tribological properties of TiSiCN composite coatings with different carbon contents deposited by plasma‐enhanced magnetron sputtering

Liu

Jin

Zhou

et al. 2023

Surface & Interface Analysis

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“…32-1383, cubic, period a = 4.327 Å) and TiN (PDF No. 38-1420, cubic, period a = 4.235 Å) [ 10 ]. The relative concentration of TiC/TiN falls from 12 to 0.25, the size of TiN crystallites decreases from 10 to 4 nm, and TiC crystallites are increased from 3 to 10 nm.…”

Section: Resultsmentioning

confidence: 99%

“…The most conventional methods of producing TiSiCN are various modifications of cathode arc evaporation of titanium [ 9 , 10 ] as well as magnetron sputtering of titanium and multi-component targets [ 11 ], CVD methods [ 12 ], including plasma-enhanced chemical vapour deposition (PECVD) methods, based on the use of liquid organosilicon precursors (OSCs) [ 7 , 10 ]. Such precursors are used because of their low cost and fairly wide range of OSCs with various relative contents of Si, C, N components.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Discharge

2022

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TiSiCN coatings have been obtained by anode evaporation of titanium and the decomposition of hexamethyldisilazane in an arc discharge, using a self-heated hollow cathode, at the pressure rate of 1 mTorr of the Ar+N2 gas mixture. The proposed method makes it possible to independently and widely change the amount of metal and precursor vapor flows, the pressure and composition of the vapor-gas mixture and the degree of ionic interaction on the surface of the growing coating within a single discharge system. The paper presents the method and the results of the effect of a current discharge (10–50 A), and the flux of precursor vapours (0–1 g/h), on deposition rates, compositions, and properties of TiSiCN coatings deposited by an advanced combined PVD+PECVD method. Dense homogeneous TiSiCN coatings up to 6 µm thick and up to 27.5 GPa in hardness were obtained at 7.5 µm/h. The composition of the obtained coatings has been studied by X-ray diffraction and X-ray photoelectron spectroscopy, and it has been shown that the presented methods can form nanocomposite coatings with nanocrystallites TiC, TiN, and TiCxN1−x 3–10 nm in the amorphous matrix based on SiCN.

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“…Membranes 2023, 13, 374 2 of 16 One of the promising SiCN-based materials are TiSiCN coatings. These films have a nanocomposite structure consisting of an amorphous SiCN matrix and embedded TiCN or TiC/TiN nanocrystals.…”

Section: Introductionmentioning

confidence: 99%

“…It makes TiSiCN a promising protective wear-resistant coating for various applications from biomedicine to aerospace applications [12][13][14]. There are a number of methods for obtaining such coatings [15], and, in our opinion, the combined plasma chemical methods using organosilicon compounds (OSCs) as a source of silicon in the coating are advanced and promising methods [16][17][18]. This work is devoted to the study of optimal conditions for the synthesis of such coatings.…”

Section: Introductionmentioning

confidence: 99%

Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors

et al. 2023

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Dense homogeneous nanocomposite TiSiCN coatings with a thickness of up to 15 microns and a hardness of up to 42 GPa were obtained by the method of reactive titanium evaporation in a hollow cathode arc discharge in an Ar + C2H2 + N2-gas mixture with the addition of hexamethyldisilazane (HMDS). An analysis of the plasma composition showed that this method allowed for a wide range of changes in the activation degree of all components of the gas mixture, providing a high (up to 20 mA/cm2) ion current density. It is possible to widely change the chemical composition, microstructure, deposition rate, and properties of coatings obtained by this method, by changing the pressure, composition, and activation degree of the vapor–gas mixture. An increase in the fluxes of C2H2, N2, HMDS, and discharge current leads to an increase in the rate of coating formation. However, the optimal coatings from the point of view of microhardness were obtained at a low discharge current of 10 A and relatively low contents of C2H2 (1 sccm) and HMDS (0.3 g/h), exceeding which leads to a decrease in the hardness of the films and the deterioration of their quality, which can be explained by the excessive ionic exposure and the non-optimal chemical composition of the coatings.

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Enhanced discharge and surface properties of TiSiCN coatings deposited by pulse-enhanced vacuum arc evaporation

Cited by 13 publications

References 32 publications

Microstructure and tribological properties of TiSiCN composite coatings with different carbon contents deposited by plasma‐enhanced magnetron sputtering

Microstructure and tribological properties of TiSiCN composite coatings with different carbon contents deposited by plasma‐enhanced magnetron sputtering

Synthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Discharge

Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors

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