2005
DOI: 10.1016/j.elecom.2005.04.040
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Enhanced anodic Si dissolution in water–ethanol acid fluoride media

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Cited by 3 publications
(2 citation statements)
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“…This limits the applications of water-meniscus-based techniques, as many fabrication processes require the use of acidic solutions that contain etching species such as F -and HF. [26,27] Recent works have reported nanostructure formation by extension of the water meniscus technique to acidic and organic menisci. [28][29][30] In these works, a HF/ethanol liquid bridge was established for oxide growth and etching.…”
Section: Introductionmentioning
confidence: 99%
“…This limits the applications of water-meniscus-based techniques, as many fabrication processes require the use of acidic solutions that contain etching species such as F -and HF. [26,27] Recent works have reported nanostructure formation by extension of the water meniscus technique to acidic and organic menisci. [28][29][30] In these works, a HF/ethanol liquid bridge was established for oxide growth and etching.…”
Section: Introductionmentioning
confidence: 99%
“…In a recent preliminary account, 23 we have anticipated the main observations of voltammetric investigations, in particular the enhancement of Si dissolution caused by the addition of ethanol at a pH > 2 and a shift of the maximum in the current-pH curves from pH 3 in water to about pH 4 in water-ethanol; we report in this paper an extended investigation, the discussion of a kinetic model, and the study of impedance response. Reported experiments are focused on solutions of HF/NH 4 F, a classical medium for wet etching and surface conditioning of silicon.…”
Section: Introductionmentioning
confidence: 74%