Enhanced anodic Si dissolution in water–ethanol acid fluoride media

Cattarin, Sandro; Musiani, Marco

doi:10.1016/j.elecom.2005.04.040

Cited by 3 publications

(2 citation statements)

References 17 publications

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“…This limits the applications of water-meniscus-based techniques, as many fabrication processes require the use of acidic solutions that contain etching species such as F -and HF. [26,27] Recent works have reported nanostructure formation by extension of the water meniscus technique to acidic and organic menisci. [28][29][30] In these works, a HF/ethanol liquid bridge was established for oxide growth and etching.…”

Section: Introductionmentioning

confidence: 99%

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Xie

Chung

Sow

et al. 2007

Adv Funct Materials

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In this work, an aqueous acidic thin‐layer‐based strategy for fabricating nanostructures on silicon by using atomic force microscopy (AFM) nanolithography is presented. The approach involves the formation of microscale droplets via dilute hydrofluoride (DHF) etching, the conversion of the droplets to acidic thin layers by AFM‐probe scanning, and subsequent lithographic operations using a biased probe in the aqueous layers. By varying the concentration of the acidic DHF layers, the thin layers can facilitate the creation of both positive and negative patterns, such as oxide dots and Si pores, through anodic oxidation and dissolution. In particular, the anodic oxidation in the acidic media is associated with the field‐enhanced nonequilibrium dissociation of the weak electrolyte. The Si pore structure formation is related to the field‐assisted dissolution of anodic oxides and the Si substrate. The acidic‐layer‐based technique allows switching between different lithographic modes by changing the acidity of the DHF layers, and is complementary to bulk solution‐based and local meniscus‐based approaches in AFM nanolithography. In principle, this method can also be extended to other materials that have similar reactions with DHF.

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Section: Introductionmentioning

confidence: 99%

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Xie

Chung

Sow

et al. 2007

Adv Funct Materials

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“…In a recent preliminary account, 23 we have anticipated the main observations of voltammetric investigations, in particular the enhancement of Si dissolution caused by the addition of ethanol at a pH > 2 and a shift of the maximum in the current-pH curves from pH 3 in water to about pH 4 in water-ethanol; we report in this paper an extended investigation, the discussion of a kinetic model, and the study of impedance response. Reported experiments are focused on solutions of HF/NH 4 F, a classical medium for wet etching and surface conditioning of silicon.…”

Section: Introductionmentioning

confidence: 74%

Kinetic Effects of Alcohol Addition on the Anodic Behavior of Silicon in Acid Fluoride Media

Cattarin

Musiani

2006

J. Phys. Chem. B

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The anodic dissolution of silicon in acid solutions of ammonium fluoride is investigated in aqueous and water-alcohol media by rotating disk voltammetry and impedance spectroscopy. The voltammograms recorded in water-alcohol media show, in comparison to water, the following effects: an increase of the dissolution currents measured at pH>2 and an opposite effect at pH<2; a distortion of the curve, with a relative increase of the characteristic currents in the region of low applied potentials, indicating easier dissolution of the "wet" oxide forming under those conditions; a shift of the maximum of the current-pH curves from about pH 3 in water to about pH 4 in 50% ethanol v/v. Analysis of impedance data at pH values 4-5 in water and water-ethanol media show similar dependence on potential for the parameters Chf (high-frequency capacitance) and RhfI (Rhf is a high-frequency resistance and I is the steady state current), suggesting the formation of oxide films with similar properties. The marked differences of anodic behavior in the two types of media are discussed and explained in terms of the effects of alcohol addition on the speciation equilibria of hydrofluoric acid and on the kinetic rate constants of dissolution of the surface oxide layer.

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Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor–electrolyte interface

Sato

Yamaguchi

Isobe

et al. 2010

Electrochemistry Communications

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Enhanced anodic Si dissolution in water–ethanol acid fluoride media

Cited by 3 publications

References 17 publications

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Kinetic Effects of Alcohol Addition on the Anodic Behavior of Silicon in Acid Fluoride Media

Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor–electrolyte interface

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