Engineering work function of graphene oxide from p to n type using a low power atmospheric pressure plasma jet

Abstract

In this work, we demonstrate doping graphene oxide (GO) films using a low power atmospheric pressure plasma jet (APPJ) with subsequent tuning of the work function.

Cu2O/CuO heterojunction catalysts through atmospheric pressure plasma induced defect passivation

“…SP = Tip Sample. [56] It has been reported, that work function of the electrode material play a critical role for electron and proton transfer in the double layer and defines the rate of catalysis. [57] Increasing work function decreases the activation energy and in turn weakens the bond between electrode and chemisorbed oxygen, the cleavage of which is rate limiting for OER activity.…”

Enhanced photoelectrochemical response of 1D TiO2 by atmospheric pressure plasma surface modification

“…To functionalize the TNR surface, an atmospheric pressure plasma jet was employed [67]. The radio frequency (RF) plasma jet with Helium carrier gas mixed with either oxygen or nitrogen was used in this process for surface modification.…”

Ultrafast epitaxial growth of CuO nanowires using atmospheric pressure plasma with enhanced electrocatalytic and photocatalytic activities

“…XPS is a powerful surface sensitive tool to probe the chemical and electronic properties at the very surface of the material, typically up to 5 nm. [30,48] Figure S4a shows the copper 2p core level spectra for the oxidized and pristine copper foils. Cu 2p core level spectra of the as received copper substrate shows two sharp peaks around 932.5 ± 0.1 eV and 952.4 ± 0.1 eV corresponding to Cu 2p 3/2 and Cu 2p 1/2 peaks of metallic copper (Cu 0 ) with a negligible satellite peak between 940.0 to 945.0 eV.…”

“…These dipole allowed transitions render this technique highly sensitive to the local electronic structure, chemical configuration, oxidation state, molecular orientation and symmetry. [30] Figure 3c shows the normalized Cu L 3,2 -edge spectra of CuOp and CuOa nanowires in Auger electron yield (AEY), total electron yield (TEY) and total flouroscence yield (TFY) modes. The corresponding surface sensitivities for this modes are 1-5 nm for AEY, 5-10 nm for TEY, and 50-100 nm for TFY.…”

“…APPJs are of significant practical importance because the plasma jets are not restricted within the dimensions of the electrodes and can be directed towards substrates. [29,30] APPJs are produced by passing a carrier gas typically He/Ar through an electric field applied between two electrodes. The plasma is blown out of the device in the form of a jet/plume by the flowing gas.…”