2021
DOI: 10.1002/nano.202100191
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Ultrafast epitaxial growth of CuO nanowires using atmospheric pressure plasma with enhanced electrocatalytic and photocatalytic activities

Abstract: This work reports an environment friendly alternative to epitaxially grow copper oxide nanowires (NWs) on copper substrates using single step atmospheric pressure plasma jet assisted oxidation. NWs of average length 300 nm are grown rapidly in 5 minutes along with transforming the surface to superhydrophilic. This method introduces defects in the nanowire structure which is otherwise difficult to achieve due to the highly isotropic nature of nanowire growth. High resolution transmission electron microscopy rev… Show more

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Cited by 5 publications
(2 citation statements)
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References 69 publications
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“…Ultrafast synthesis techniques also have not demonstrated high-resolution (sub-nm) spatially resolved materials, yet they are possible and highly desired in applications such as catalysis. [240][241][242] A versatile choice of materials can be synthesized with future highly spatial and temporal resolved ultrafast synthesis techniques. The scalable production (in kilograms or tons) of highly precise materials (in terms of microstructures and resolutions) is also challenging but of vital importance to a broader application of ultrafast manufacturing.…”
Section: Perspectives and Conclusionmentioning
confidence: 99%
“…Ultrafast synthesis techniques also have not demonstrated high-resolution (sub-nm) spatially resolved materials, yet they are possible and highly desired in applications such as catalysis. [240][241][242] A versatile choice of materials can be synthesized with future highly spatial and temporal resolved ultrafast synthesis techniques. The scalable production (in kilograms or tons) of highly precise materials (in terms of microstructures and resolutions) is also challenging but of vital importance to a broader application of ultrafast manufacturing.…”
Section: Perspectives and Conclusionmentioning
confidence: 99%
“…The synchrotron near edge X-ray absorption fine structure (NEXAFS) test is a useful tool to find out the electronic states and photophysics of materials [ 109 , 110 , 111 ]. The synchrotron NEXAFS test was utilized for the analysis of CDs-based materials.…”
Section: Key Factorsmentioning
confidence: 99%