Engineering of III-Nitride Semiconductors on Low Temperature Co-fired Ceramics

Abstract

This work presents results in the field of advanced substrate solutions in order to achieve high crystalline quality group-III nitrides based heterostructures for high frequency and power devices or for sensor applications. With that objective, Low Temperature Co-fired Ceramics has been used, as a non-crystalline substrate. Structures like these have never been developed before, and for economic reasons will represent a groundbreaking material in these fields of Electronic. In this sense, the report presents the characterization through various techniques of three series of specimens where GaN was deposited on this ceramic composite, using different buffer layers, and a singular metal-organic chemical vapor deposition related technique for low temperature deposition. Other single crystalline ceramic-based templates were also utilized as substrate materials, for comparison purposes.

A Review CHEMICAL VAPOR DEPOSITION : PROCESS AND APPLICATION

“…Chemical Vapor Deposition telah lama berkembang, seperti literature yang telah kami dapatakan yaitu dari tahun 2000-2018, sudah banyak sekali yang dihasilkan oleh Chemical Vapor Deposition. (61)(62)(63)(64)(65)(66)(67)…”