2012
DOI: 10.7567/jjap.51.061602
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Electrospray Deposition of Poly(3-hexylthiophene) Films for Crystalline Silicon/Organic Hybrid Junction Solar Cells

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Cited by 5 publications
(2 citation statements)
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“…The usage of the electrospray deposition (ESD) made possible the uniform coating, although the film deposition rate was very slow of 0.2 nm/s. 4 Simple coating technique with high film uniformity, therefore, is strongly required on hydrophobic c-Si wafer. Recently, Vosgueritchian et al revealed that the Zonly fluorosurfactant-treated PEDOT:PSS film showed lower sheet resistance compared to untreated films, and it is a possible material for indium tin oxide (ITO)-free organic photovoltaics as stretchable and flexible transparent electrodes.…”
mentioning
confidence: 99%
“…The usage of the electrospray deposition (ESD) made possible the uniform coating, although the film deposition rate was very slow of 0.2 nm/s. 4 Simple coating technique with high film uniformity, therefore, is strongly required on hydrophobic c-Si wafer. Recently, Vosgueritchian et al revealed that the Zonly fluorosurfactant-treated PEDOT:PSS film showed lower sheet resistance compared to untreated films, and it is a possible material for indium tin oxide (ITO)-free organic photovoltaics as stretchable and flexible transparent electrodes.…”
mentioning
confidence: 99%
“…Several attempts have been made for the uniform deposition of PEDOT:PSS on the textured c-Si substrate by several deposition techniques such as SC with surfactant additive, 11) screen printing, 12) ink-jet printing, electrospray deposition (ESD), [13][14][15][16][17] and chemical mist deposition (CMD). [18][19][20][21][22][23][24] Among several deposition techniques, gas-phase deposition is a possible candidate for the uniform deposition of organic materials on textured Si substrates. However, few studies have been performed on the deposition of organic materials by gas-phase deposition and their growth kinetics.…”
Section: Introductionmentioning
confidence: 99%