Electron solvation and solvation-induced crystallization of an ammonia film on Ag(111) studied by 2-photon photoemission

Kwon, Hyuk‐Sang; Hwang, Kiwook; Park, Juyeon; Ryu, Sunmin; Kim, Seong Keun

doi:10.1039/c1cp20804g

Cited by 4 publications

(4 citation statements)

References 37 publications

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“…The total change in R is virtually constant across this range of NH 3 concentrations, that spans a factor of 350. Ammonia is known from UHV studies to adsorb molecularly, without decomposition, on silver surfaces, to form hydrogen-bonded multilayers, and to desorb over a broad temperature range from 145 to 210 K. 32,33 The observed reversibility of the resistance change seen in Figure 4a, then, is presumably caused by the spontaneous desorption of NH 3 from the nanowire surfaces at ∼300 K, and is consistent with the known behavior of NH 3 on silver surfaces in vacuum. After the formation of a CRJ, the baseline resistance of the nanowire, R 0 , is elevated by a factor of 17 500 and exposure to NH 3 causes an abrupt increase in R with ΔR/R 0 ranging from 1 to 2% at 200 ppm to 138% at 7% (Figure 4b).…”

supporting

confidence: 68%

A Chemically-Responsive Nanojunction within a Silver Nanowire

Xing

Kung

et al. 2012

Nano Lett.

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The formation of a nanometer-scale chemically responsive junction (CRJ) within a silver nanowire is described. A silver nanowire was first prepared on glass using the lithographically patterned nanowire electrodeposition method. A 1-5 nm gap was formed in this wire by electromigration. Finally, this gap was reconnected by applying a voltage ramp to the nanowire resulting in the formation of a resistive, ohmic CRJ. Exposure of this CRJ-containing nanowire to ammonia (NH(3)) induced a rapid (<30 s) and reversible resistance change that was as large as ΔR/R(0) = (+)138% in 7% NH(3) and observable down to 500 ppm NH(3). Exposure to water vapor produced a weaker resistance increase of ΔR/R(0,H(2)O) = (+)10-15% (for 2.3% water) while nitrogen dioxide (NO(2)) exposure induced a stronger concentration-normalized resistance decrease of ΔR/R(0,NO(2)) = (-)10-15% (for 500 ppm NO(2)). The proposed mechanism of the resistance response for a CRJ, supported by temperature-dependent measurements of the conductivity for CRJs and density functional theory calculations, is that semiconducting p-type Ag(x)O is formed within the CRJ and the binding of molecules to this Ag(x)O modulates its electrical resistance.

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confidence: 68%

A Chemically-Responsive Nanojunction within a Silver Nanowire

Xing

Kung

et al. 2012

Nano Lett.

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“… f Electron stimulated desorption-ion angular distributions (ESDIAD), 24 L exposure of NH 3 g TDS, 1.3 ML NH 3 h HREELS, <0.05 L exposure of NO …”

Section: Resultsmentioning

confidence: 99%

Atomic and Molecular Adsorption on Ag(111)

et al. 2018

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The adsorption of atomic (H, C, N, O, S) and molecular (OH, CH x , NH x , CO, NO, CN, N2, HNO, NOH, HCN, x = 1–3) species at 1/4 monolayer coverage on an extended Ag(111) surface was studied using periodic density functional theory. Geometries and energies were calculated self-consistently using the PW91 functional; nonself-consistent energies using the RPBE functional are also provided. We analyze the binding energies, binding geometries, estimated diffusion barriers, harmonic vibrational frequencies, and energetic and geometric deformation parameters of these adsorbates, comparing them to experimental and theoretical results whenever possible. PW91 gives binding energies that match experimental binding energies more closely than RPBE, which consistently predicts weaker binding than PW91. The data were then used to construct and analyze thermochemistry-only potential energy pathways for the hydrocarbon-assisted and hydrogen-assisted selective catalytic reduction (SCR) of nitric oxide (NO). These analyses provide preliminary insights into the possible mechanistic paths of the SCR of NO on Ag(111). Specifically, we show that deep dehydrogenation leading to the formation of atomic intermediates is not favored on Ag(111).

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“…Crystallization from saturated solutions is driven by changes in the free energy 8 , and that is the reason why it is sensible to processes involving electric discharges in liquids. In fact, some of the physical and chemical processes avaible in the plasma-liquid interface were already studied to induce or assist crystallization, as UV 9 , solvated electrons 10 and electric fields 11,12 .…”

Section: Introductionmentioning

confidence: 99%

Sodium Chloride Crystallization by Electric Discharge in Brine

et al. 2017

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Electrical discharges in liquids are currently used to synthesize nanoparticles. The plasma-liquid interaction is complex, where parameters such as electric field, ion charges and other species present are important. In order to understand the mechanism of crystallization, mother liquor (saturated solution of NaCl, MgCl 2 and KCl) was used to study the effectiveness and selectivity of the crystallization caused by the application of plasma. Discharge was applied with the solution at room temperature or during cooling. X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM) and chemical analysis was used to evaluate the structure and composition effects on crystal structure and composition. It was observed that the discharge induces selectively crystallization, and when compared to crystals obtained conventionally by cooling, were smaller and more uniform. We therefore confirm that plasma in liquid can also be used to selectively crystallize materials in atmospheric pressure, where the sizes of the crystals must be dependent on the parameters used.

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Electron solvation and solvation-induced crystallization of an ammonia film on Ag(111) studied by 2-photon photoemission

Cited by 4 publications

References 37 publications

A Chemically-Responsive Nanojunction within a Silver Nanowire

A Chemically-Responsive Nanojunction within a Silver Nanowire

Atomic and Molecular Adsorption on Ag(111)

Sodium Chloride Crystallization by Electric Discharge in Brine

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