2014
DOI: 10.1016/j.apsusc.2013.10.167
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Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices

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“…To explain the last results two reasons can be advocated. The first one is that the irradiation could increase the kinetic of the contamination deposition [20]. The second possible reason is that the broken and excited hydrocarbons molecules by the Ar bombardment are relaxed and recombined slowly between two etching steps.…”
Section: Evolution Of Electron Emission Yield During the Cleaning Processmentioning
confidence: 99%
“…To explain the last results two reasons can be advocated. The first one is that the irradiation could increase the kinetic of the contamination deposition [20]. The second possible reason is that the broken and excited hydrocarbons molecules by the Ar bombardment are relaxed and recombined slowly between two etching steps.…”
Section: Evolution Of Electron Emission Yield During the Cleaning Processmentioning
confidence: 99%