Investigation of the electron emission properties of silver: From exposed to ambient atmosphere Ag surface to ion-cleaned Ag surface

Abstract

Electron emission properties of materials are highly dependent to the surface and the first nanometres subsurface. Technical materials, i.e used within applications are ordinarily exposed to atmosphere, which interacts with the surface. The contamination layer building up at the surface of materials and/or oxidation layer affects dramatically the electron emission proprieties. In this paper, starting from 99.99% pure silver sample, exposed 4 years to ambient atmosphere, we monitored the variations of the electron emission properties and the surface composition during step by step ion etching procedure.

Ionizing Doses Calculations for Low Energy Electrons in Silicon and Aluminum

“…All measurements are performed in the ultrahigh (10 -9 -10 -10 mbar) vacuum facility located at ONERA. A full description of this facility, entirely dedicated and designed for the study of electron emission can be found in references [19]- [20]. It uses an ELG-2 electron gun from Kimball Physics and an ion gun from Tectra for Ar-etching.…”

“…In this paper, simulations from the Monte Carlo (MC) code OSMOSEE are compared with experimental measurements of Electron Emission Yields (EEY) and energy loss spectra obtained in ultrahigh vacuum on Ar-etched samples with a facility entirely dedicated and designed to electron emission [19]- [20]. T 0018-9499 (c) 2016 IEEE.…”

Study of required conditions to limit the dielectric charging phenomenon when measuring the electron emission yield from thin dielectric layers

“…The TEEY was measured in an experimental facility specially designed for electron emission characterization [12]. The measurements were realized under high vacuum (5 x 10 -6 Pa).…”

“…The TEEY is a phenomenon that is mainly affected by the first few or tens nanometers beneath the surface [8]. The contamination layer that usually builds-up on the surface after air exposure, has therefore a dominant impact on the TEEY [12]. To minimize contamination, the samples were quickly introduced after adjusting the layer thickness into the vacuum chamber, ensuring in that way a minimum exposing time.…”

Influence of work function on the multipactor threshold

“…We define the Total Electron Emission Yield (TEEY) as the number of backscattered and secondary electrons over the number of primary electrons and it must be larger than unity for the electron cloud to develop. The TEEY is highly dependent on the energy and incidence angle of the primary flux [4], the nature and surface condition of the sample [5], the presence of a magnetic field [6]... External magnetic or electric field will also modify the particle trajectories, influencing the RF/electron resonance and thus making the multipactor phenomenon more complex [7].…”