Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001)

Liu, Feng; Sturm, Jacobus Marinus; Lee, Chris; Bijkerk, Frederik

doi:10.1016/j.susc.2015.09.009

Cited by 14 publications

(17 citation statements)

References 41 publications

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“…Regarding transition metals and their oxides, the 2 understanding of such phenomena is paramount due to their wide range of applications. For ultrathin metallic films applied in micro-electronics, catalysis, or soft x-ray optics, small changes in the composition of surface and near-surface regions may lead to dramatic differences in properties [1][2][3][4][5] .…”

Section: Introductionmentioning

confidence: 99%

Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study

Boas

Sturm

Bijkerk

2019

Journal of Applied Physics

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In this study, we combine Low Energy Ion Scattering (LEIS) static and sputter depth profiles for characterization of the oxidation kinetics on Zr, Mo, Ru and Ta films of various thicknesses, following exposure to atomic oxygen at room temperature (∼20 • C). A method for non-destructive determination of the oxide growth rate via LEIS static depth profiling (static DP) is presented in detail. This method shows high sensitivity to the oxide thickness formed, and the results are in agreement with those obtained by X-ray reflectometry (XRR) and sputter depth profiling (sputter DP). Sequential exposures of oxygen isotopes in combination with LEIS sputter DP are applied to elucidate the growth mechanism of the oxide films. The results indicate that the oxidation kinetics at the applied experimental conditions is directly influenced by the metal work function, characterizing a Cabrera-Mott growth type. The maximum thickness of the formed oxide and oxide growth rate are in the order: Zr ≈ Ta > Mo > Ru. The combining of analysis by LEIS static DP and isotope tracing sputter DP is decisive in the characterization of oxidation kinetics in the room temperature regime.

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Section: Introductionmentioning

confidence: 99%

Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study

Boas

Sturm

Bijkerk

2019

Journal of Applied Physics

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“…Unlike Raman spectroscopy, TPD involves heating and therefore irreversible changes the coverage of adsorbed molecules and/or surface during measurement. 46,47 As TPD involves measuring small molecular masses, residual gases within the experimental chamber will adversely affect the measurements. The technique therefore requires the use of an Ultra High Vacuum system.…”

Section: Temperature Programmed Desorptionmentioning

confidence: 99%

“…69,70 Previous studies on this topic investigated carbon growth and oxidation separately, or focused on the balance between different contamination and cleaning mechanisms. [45][46][47]71 Most literature results evaluate contamination in terms of XUV reflection loss, or thickness of the formed carbon or oxide layers. 69,72 In this study, we focus more on the molecular mechanisms of contamination and cleaning reactions, employing in-situ RAIRS and TPD.…”

Section: Thesis Outline and Outlookmentioning

confidence: 99%

Extreme UV photon and hydrogen radical interaction with graphene and ruthenium surfaces

Mund¹

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“…Analyzed species on the surface are desorbed during measurements, thus it a technique that significantly changes the surface chemical composition during the measurement. 66,[69][70][71] Residual background gases will prevent the TPD from being measured, thus the measurements require UHV. By combining TPD and RAIRS, it is often possible to draw more quantitative conclusions from the results than from both techniques separately.…”

Section: Temperature Programed Desorptionmentioning

confidence: 99%

Metal diffusion and chemical processes of mono and bi-layer thin films

Pachecka¹

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Cover: Delta value for the full spectral range obtained from in situ measurement of tin deposition on silicon wafer. Picture shows data obtained at 1 minute intervals during deposition. Nederlandse titel: Metaal diffusie en chemische oppervlakte processen van mono en bi-laag dunne films This dissertation has been approved by: Supervisor: prof.dr. F. Bijkerk ISBN: 978-90-365-4568-6 ©Małgorzata Pachecka (2018) T This thesis is based on the following publications: Chapter 2: Pachecka, M.; Sturm, J. M.; van de Kruijs, R. W. E.; Lee, C. J.; Bijkerk, F., Electronegativity-Dependent Tin Etching from Thin Films. AIP Adv. 2016, 6, 075222. Chapter 3: Pachecka, M.; Lee, C. J.; Sturm, J. M.; Bijkerk, F., Tin Etching from Metallic and Oxidized Scandium Thin Films. AIP Adv. 2017, 7, 085107. Chapter 4: Pachecka, M.; Lee, C. J.; Sturm, J. M.; Bijkerk, F., Metal Diffusion Properties of Ultra-Thin High-k Sc2O3 Films. AIP Adv. 2017, 7, 105324. Chapter 5: Pachecka, M.; Sturm, J. M.; Lee, C. J.; Bijkerk, F., Adsorption and Dissociation of CO2 on Ru(0001).

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Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001)

Cited by 14 publications

References 41 publications

Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study

Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study

Extreme UV photon and hydrogen radical interaction with graphene and ruthenium surfaces

Metal diffusion and chemical processes of mono and bi-layer thin films

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