2008
DOI: 10.1002/anie.200704105
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Electron‐Beam Chemical Lithography with Aliphatic Self‐Assembled Monolayers

Abstract: Nanopatterns: The feasibility of a new lithographic technique, chemical lithography with self‐assembled monolayers (SAMs) of commercially available aliphatic compounds as resist materials, is demonstrated by the fabrication of polymer nanopatterns (see image). The technique is based on an irradiation‐promoted exchange reaction. Patterning requires a much lower dose than electron‐beam chemical lithography with aromatic SAMs as resists.

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Cited by 104 publications
(132 citation statements)
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“…[6][7][8][9] That work exploited the dependence of polymer-brush height on initiator surface density, [10][11][12] and it was shown that the grafting density could be manipulated by varying the electron dose during the lithography process. [6][7][8] Although elegant, the process requires access to scanning electron microscopy (SEM) with pattern generator or a dedicated electron-beam lithography system, and is thus inaccessible to a large number of researchers.…”
mentioning
confidence: 99%
“…[6][7][8][9] That work exploited the dependence of polymer-brush height on initiator surface density, [10][11][12] and it was shown that the grafting density could be manipulated by varying the electron dose during the lithography process. [6][7][8] Although elegant, the process requires access to scanning electron microscopy (SEM) with pattern generator or a dedicated electron-beam lithography system, and is thus inaccessible to a large number of researchers.…”
mentioning
confidence: 99%
“…[16] Bemerkenswert ist, dass im Vergleich zu vielen anderen Techniken [17][18][19] nicht nur lineare oder radiale Gradienten, sondern auch Gradientenmuster jeglicher Form durch EBL erhalten werden können. [20] Einfache periAbbildung 2. a) C1s-XP-Spektren der unbehandelten und elektronenstrahlmodifizierten EG7/Au-SAMs. In den Spektren werden zwei Signale sichtbar, die den OEG-(schwarz) und Alkan-Teilen (grau) der EG7-Moleküle zugeordnet werden können.…”
unclassified
“…1−3 They can be fabricated by chemical lithography, 4 microcontact printing (μCP), 5 electron-beam lithography (EBL), 6 electronbeam chemical lithography (EBCL), 7,8 and dip-pen nanodisplacement lithography (DNL), 9 etc. Among these methods, although μCP is a particularly simple and cost-effective tool to fabricate polymer brushes, the master preparation process still requires the expensive and complex UV lithographic instrument.…”
Section: ■ Introductionmentioning
confidence: 99%