Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes

Abstract

ABSTRACT:A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.

Controlled evaporative self-assembly of Fe3O4 nanoparticles assisted by an external magnetic field

“…S1 †), were used as nonvolatile solute. According to our previous work, 39 if Fe 3 O 4 NPs solution were limited in sphere-on-at geometry (Fig. 1A), concentric rings could be formed (Fig.…”

“…The process for achieving 2D selfassembly of Fe 3 O 4 NPs via magnetic eld assisted CESA is schematically shown in Fig. According to our previous work, 39 if Fe 3 O 4 NPs solution were limited in sphere-on-at geometry (Fig. Fe 3 O 4 NPs with a diameter of 100 nm (Fig.…”

“…In addition, with increasing concentration of Very recently, patterned polymer brushes can be prepared without a surface bound initiator by SIPGP on photoactive patterned SAMs. 39,[42][43][44] As photoactive sites, double bonds on the surface of Fe S5B †). Aer SIPGP, a higher pattern of 230 nm is formed (Fig.…”

Effect of miscibility on migration of third component in star‐like co‐continuous and disperse‐within‐disperse mixed brushes

“…Polymer mixed brushes have been obtained using the grafting‐from and grafting‐to techniques , , , , . Patterned polymer brushes, due to their effective function in surface modification, have received a great deal of attention , . The patterning approaches, in particular for polymer mixed brushes, include lithographic techniques ranging from the conventional photolithography to microcontact printing, electron beam patterning and dip‐pen nanodisplacement lithography , , …”

“…Regarding the disadvantages of various polymer brush synthesis methods such as grafting to and grafting from, and because of the drawbacks of conventional patterning methods including high cost, difficult processing and low accuracy,, , , a novel technique was introduced for developing polymer mixed brushes . In this method, single crystals of amorphous–crystalline block copolymers were grown with a similar crystalline block, resulting in some unique properties, i.e.…”