Herstellung von Proteinmustern durch Schreiben in proteinabweisende Matrizen

Abstract

Ein effizienter und vielseitiger Ansatz ergibt Proteinmuster jeglicher Form auf einer variablen Längenskala. Die Muster werden direkt durch Elektronenstrahllithographie in einen Oligo‐ oder Polyethylenglycol‐basierten Film geschrieben.

Fabrication of ssDNA/Oligo(ethylene glycol) Monolayers and Complex Nanostructures by an Irradiation‐Promoted Exchange Reaction

“…Furthermore, as seen in the above figures, no DNA brush or contamination-related features were observed for the one-component EG3 template, where without irradiation, no exchange with A25SH occurs. This guarantees, in agreement with previous studies, [28,29] a DNAfree protein-repelling background for growing ssDNA nanostructures on ssDNA/AT-OEG templates prepared by IPER-EBL.…”

“…A primary monolayer of a test OEG-AT compound, HO-(CH 2 CH 2 O) 3 (CH 2 ) 11 SH (termed EG3; see Refs. [28] and [29] for its protein-resistance) was homogeneously irradiated with electrons or using EBL, resulting in preferential damage of the OEG chain parts and cleavage of thiolate-gold bonds. [27,29] Next, the film was incubated with a solution of a model thiolated homo-oligonucleotide, 5'-SH-(CH 2 ) 6d(A) 25 -3' (termed A25SH) for the exchange reaction promoted by the irradiation defects.…”