2000
DOI: 10.1063/1.125640
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Electroluminescence of a cubic GaN/GaAs (001) p–n junction

Abstract: A cubic GaN p–n diode has been grown on n-type GaAs (001) substrates by plasma assisted molecular epitaxy. For p- and n-type doping, elemental Mg and Si beams have been used, respectively. The optical properties are characterized by photoluminescence at room temperature and 2 K. Current–voltage and capacitance–voltage measurements of the cubic GaN n+–p junction are performed at room temperature. The electroluminescence at 300 K is measured through a semitransparent Au contact. A peak emission at 3.2 eV with a … Show more

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Cited by 61 publications
(29 citation statements)
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“…The growth of cubic GaN layers with excellent structural, optical and electrical properties (as demonstrated by the observation of optically stimulated emission at room temperature from cleaved c-GaN layers [91] and electroluminescence from a MBE grown c-GaN p-n junction [85]) has clearly demonstrated the potential of III-nitrides with cubic crystal structure for the realization of optoelectronic devices like light-emitting diodes and laser diodes. However, the bulk of experience accumulated with hexagonal III-nitrides shows that all working devices contain InGaN in the active region.…”
Section: Mbe Of Cubic Inganmentioning
confidence: 98%
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“…The growth of cubic GaN layers with excellent structural, optical and electrical properties (as demonstrated by the observation of optically stimulated emission at room temperature from cleaved c-GaN layers [91] and electroluminescence from a MBE grown c-GaN p-n junction [85]) has clearly demonstrated the potential of III-nitrides with cubic crystal structure for the realization of optoelectronic devices like light-emitting diodes and laser diodes. However, the bulk of experience accumulated with hexagonal III-nitrides shows that all working devices contain InGaN in the active region.…”
Section: Mbe Of Cubic Inganmentioning
confidence: 98%
“…A diode fabricated by Mg and Si doping of MBE-grown c-GaN on n-type GaAs (001) has been reported by As et al [85] .Current-voltage (I-V), capacitance-voltage (C-V), photoluminescence (PL) and electroluminescence (EL) measurements were used to characterize the c-GaN p-n homojunction at room temperature. The cubic GaN p-n homojunction structure consisted of a 760 nm thick p-type GaN:Mg on top of a 500 nm thick n-type GaN:Si.…”
Section: Light Emitting Diodesmentioning
confidence: 99%
“…Also the slightly less stable cubic polytype of GaN seems a promising material for laser applications, but device technology is still at a very early stage. However, first light-emitting diodes based on cubic GaN have been constructed [3,4]. Dislocations, emerging in high densities in most GaN growth processes, can induce electronic states deep in the band-gap.…”
Section: Introductionmentioning
confidence: 99%
“…In the literature, cubic phase GaN has first been realized via direct deposition on cubic phase substrates such GaAs [5], 3C-SiC [6], Si (100) [7], and MgO [8]. However, such direct deposition on non-native substrates suffers from high defectivity, structural metastability (i.e.…”
Section: Introductionmentioning
confidence: 99%