2006
DOI: 10.1063/1.2195009
|View full text |Cite
|
Sign up to set email alerts
|

Electroluminescence at 375nm from a ZnO∕GaN:Mg∕c-Al2O3 heterojunction light emitting diode

Abstract: n - Zn O ∕ p - Ga N : Mg heterojunction light emitting diode (LED) mesas were fabricated on c-Al2O3 substrates using pulsed laser deposition for the ZnO and metal organic chemical vapor deposition for the GaN:Mg. High crystal quality and good surface morphology were confirmed by x-ray diffraction and scanning electron microscopy. Room temperature (RT) photoluminescence (PL) showed an intense main peak at 375nm and a negligibly low green emission indicative of a near band edge excitonic emission from a ZnO laye… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

4
108
0
3

Year Published

2009
2009
2012
2012

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 179 publications
(115 citation statements)
references
References 21 publications
4
108
0
3
Order By: Relevance
“…For both SOG and PMMA devices, achieved efficiencies are much higher compared to previous reports on heterojunction LEDs based on n-ZnO/p-GaN. 6,29 While the nitride based devices which are currently commercially available can exhibit higher brightness and efficiency compared to the devices in this work, it should be noted that we do not use any kind of reactive ion etching which simplifies device fabrication. Also, the light extraction from the devices and the contact resistance is currently not optimized, so that further improvements can be expected with device optimization.…”
Section: E High Brightness Ledsmentioning
confidence: 62%
See 4 more Smart Citations
“…For both SOG and PMMA devices, achieved efficiencies are much higher compared to previous reports on heterojunction LEDs based on n-ZnO/p-GaN. 6,29 While the nitride based devices which are currently commercially available can exhibit higher brightness and efficiency compared to the devices in this work, it should be noted that we do not use any kind of reactive ion etching which simplifies device fabrication. Also, the light extraction from the devices and the contact resistance is currently not optimized, so that further improvements can be expected with device optimization.…”
Section: E High Brightness Ledsmentioning
confidence: 62%
“…42 At higher forward bias (4.5 V < V < 15 V), the I-V curve could be described with I $ V b , where b ¼ 2.1, close to the I $ V 2 relationship common for wide band gap materials. 6 Under reverse bias, large current has been observed. n-ZnO/p-GaN heterojunction devices without intrinsic or insulating layers frequently show leaky I-V curves 6,9,10,14,17,29 in agreement with large currents under reverse bias observed in our work.…”
Section: -mentioning
confidence: 98%
See 3 more Smart Citations